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Journal ArticleDOI

Piezo-spectroscopic determination of the ratio of electron—To phonon to hole—To phonon interaction in silicon

TLDR
In this paper, the authors investigated the stress-dependence of the normalized wavelength-modulated absorption spectra of TO-phonon assisted indirect transition in silicon at 77 K.
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This article is published in Solid State Communications.The article was published on 1978-10-01. It has received 3 citations till now. The article focuses on the topics: Silicon & Phonon.

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Citations
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Journal ArticleDOI

Band structure properties, phonons, and exciton fine structure in 4 H -SiC measured by wavelength-modulated absorption and low-temperature photoluminescence

TL;DR: In this article, the authors measured the wavelength-modulated absorption (WMA) spectrum of $4H$-SiC over a broader wavelength range (3500--3800 ) and at a higher resolution than in previous work.
Book ChapterDOI

Intervalley Electron-Phonon and Hole-Phonon Interactions in Semiconductors: Experiment and Theory

TL;DR: In this article, the authors discuss various piezospectroscopic experiments that have been performed on Si (Γ-Δ),3 GaP(γ-X)1,11, and Ge (γ-L)4, combined with previously measured values of the absorption coefficient, can be used to evaluate the EP and HP scattering matrix elements for the TO phonon in Si2 and the LA and TA phonons in GaP2,11.
References
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Journal ArticleDOI

Energy-Band Structure of Germanium and Silicon: The k·p Method

TL;DR: In this paper, the energy bands of germanium and silicon, throughout the entire Brillouin zone, have been obtained by diagonalizing a k\ifmmode\cdot\else\textperiodcentered\fi{}p Hamiltonian referred to 15 basis states at k=0.
Journal ArticleDOI

Influence of Uniaxial Stress on the Indirect Absorption Edge in Silicon and Germanium

TL;DR: In this paper, the indirect optical absorption edge in silicon and germanium has been studied in the presence of shear strain and the results have been interpreted in terms of changes in the valence and conduction-band structure with strain.
Journal ArticleDOI

Effects of Uniaxial Stress on the Indirect Exciton Spectrum of Silicon

TL;DR: In this paper, the authors measured the stress dependence of the indirect exciton spectrum of silicon at 77.5 K for static uniaxial compression along the [111], [001], and [110] directions with light polarized parallel and perpendicular to the stress direction, using wavelength modulation.
Journal ArticleDOI

Temperature dependence of the relative integrated intensities of symmetry-allowed phonon-assisted exciton emission in Si and Ge

TL;DR: In this article, a model based on a splitting of the exciton ground state combined with different transition rates for the split exciton levels was developed to interpret the observed temperature dependence of the relative intensities of symmetry-allowed phonon-assisted exciton emission in Si and Ge.
Journal ArticleDOI

Determination of the mass-anisotropy exciton splitting in silicon

TL;DR: In this article, the fundamental exciton in Si was determined by application of weak [001] deformations, bringing the components separately into light, and subsequent extrapolation to the zero-stress limit.
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