Patent
Plasma focus high energy photon source with blast shield
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TLDR
In this paper, a pair of plasma pinch electrodes are located in a vacuum chamber and a blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation.Abstract:
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.read more
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References
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Patent
Plasma focus high energy photon source
TL;DR: In this article, a pair of plasma pinch electrodes are located in a vacuum chamber, and a working gas supply system is provided, which includes a noble buffer gas and an active gas chosen to provide a desired spectral line.
Patent
Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
TL;DR: In this article, a pulsed capillary discharge lamp for extreme ultraviolet microlithography is described, which is used for resist exposure tools, microscopy, interferometry, metrology, biology and pathology.
Patent
Plasma gun and methods for the use thereof
TL;DR: In this article, a high pulse repetition rate (PRF) plasma gun is provided which inlets a selected propellant gas into a column formed between a center electrode (12) and a coaxial outer electrode (14).
Patent
Plasma X-ray source
TL;DR: In this paper, a pinch region is defined with a central axis and an RF electrode disposed around the pinch region for preionizing the gas in the pinch to form a symmetrical around the central axis, and a pinch anode and the pinch cathode are disposed at opposite ends of the pinch area to produce an azimuthal magnetic field.
Patent
Laser beam plasma pinch X-ray system
Louis Cartz,Arnold Weiss,Herman P. Schutten,Gordon B. Spellman,Stanley V. Jaskolski,Peter H. Wackman +5 more
TL;DR: In this article, a system for producing plasma pinch X-rays usable in X-ray lithography is described, where ionized heated plasma vapor is repeatably generated directly from solid material by impingement of a plurality of circumferentially spaced laser beams to generate an annulus of plasma.