Patent
Process and apparatus for forming nanoparticles using radiofrequency plasmas
Reads0
Chats0
TLDR
In this paper, a method for the synthesis of single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles with diameters of no more than 10 nm, is described.Abstract:
Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.read more
Citations
More filters
Patent
Substrate Processing Apparatus
TL;DR: In this article, a bypass pipe is connected between the mechanical booster pump and the rest vacuum pumps located at a downstream side of the booster pump to prevent the exhaust gas from diffusing back to the inside of a process chamber.
Patent
Method and structure for thin film photovoltaic materials using bulk semiconductor materials
TL;DR: In this paper, a photovoltaic device with a nanostructured material positioned between an electron collecting electrode and a hole collecting electrode is presented, where negatively charged carriers generated by optical absorption by the nanostructure are preferentially separated into the electron transporting/hole blocking material.
Patent
In situ modification of group iv nanoparticles using gas phase nanoparticle reactors
TL;DR: In this article, a method for creating an organically capped Group IV semiconductor nanoparticle is described, in which the Group IV precursors are generated using a laser pyrolysis apparatus.
Patent
Methods of filling a set of interstitial spaces of a nanoparticle thin film with a dielectric material
TL;DR: In this paper, a method of forming a densified nanoparticle thin film is disclosed, which includes positioning a substrate in a first chamber; and depositing a nanoparticle ink, the nanoparticles ink including a set of Group IV semiconductor particles and a solvent.
Patent
Gas-phase reactor and system having exhaust plenum and components thereof
Eric Hill,Shawn G. Thomas +1 more
TL;DR: An improved exhaust system for a gas-phase reactor and a reactor and system including the exhaust system including a channel fluidly coupled to an exhaust plenum is described in this article. But it does not specify the design of the exhaust manifold.
References
More filters
Patent
Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices
Stephen Empedocles,Larry Bock,Calvin Y. H. Chow,Xianfeng Duan,Chunming Niu,George Pontis,Vijendra Sahi,Linda T. Romano,David P. Stumbo +8 more
TL;DR: In this article, the authors present methods and methods for assembling nanostructures into functional elements such as junctions, arrays and devices, as well as systems for practicing the methods.
Patent
Plasma treatment method and apparatus
Masayuki Tomoyasu,Akira Koshiishi,Kosuke Imafuku,Shosuke Endo,Kazuhiro Tahara,Yukio Naito,Kazuya Nagaseki,Keizo Hirose,Mitsuaki Komino,Hiroto Takenaka,Hiroshi Nishikawa,Yoshio Sakamoto +11 more
TL;DR: In this article, a treatment apparatus for treating a substrate under decompressed atmosphere is described, consisting of a chamber, an exhausting means for exhausting the chamber, a first electrode provided in the chamber on which the substrate is mounted or held, a second electrode provided on the chamber opposing the first electrode, a liquid supply source containing a liquid material from which a process gas is generated, a housing provided between the liquid source and the chamber to be communicated to the liquid supplier and the room, a porous heating unit arranged in the housing for generating the process gas by heating the liquid material supplied
PatentDOI
Direct current high-pressure glow discharges
TL;DR: The microhollow cathode discharge, which is sustained between two closely spaced electrodes with an opening formed in the electrodes, serves as a plasma cathode for the high-pressure glow.
Patent
Optical devices with engineered nonlinear nanocomposite materials
TL;DR: In this paper, a waveguide core and a nanocomposite material optically coupled to the waveguide was described. But the authors did not specify the number of quantum dots.
Patent
Plasma processing apparatus
TL;DR: In this article, a plasma processing apparatus is configured to alternately introduce an etch gas and a deposition gas into the chamber through the at least on gas inlet, and to strike a plasma into the etch gases and the deposition gas alternately introduced in the chamber.