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Rapid Thermal Processing of Semiconductors

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TLDR
In this article, the authors describe the following processes: Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon, component evaporation, defect Annealing, and impurity diffusion in III-V Semicondutors.
Abstract
Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.

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Modeling and temperature control of rapid thermal processing

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Iron Oxide Films Prepared by Rapid Thermal Processing for Solar Energy Conversion.

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Intense pulsed light treatment of cadmium telluride nanoparticle-based thin films.

TL;DR: The results found that optimum recrystallization and a decrease in defects occurred when pulses of light with an energy density of 21.6 J cm(-2) were applied, and for the first time, IPL treatment on CdTe thin films is reported.
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Visible luminescence from europium-doped alumina sol–gel-derived films confined in porous anodic alumina

TL;DR: In this article, strong photoluminescence (PL) of europium-doped alumina sol-gel-derived films fabricated onto porous anodic alumina of 30 μm thickness was reported.