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Journal ArticleDOI

Revised Calibration for High Pressure Electrical Resistance Cell

H. G. Drickamer
- 01 Nov 1970 - 
- Vol. 41, Iss: 11, pp 1667-1668
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This article is published in Review of Scientific Instruments.The article was published on 1970-11-01. It has received 111 citations till now. The article focuses on the topics: Electrical resistance and conductance & Calibration.

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Citations
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Ultrahigh pressure diamond‐anvil cell and several semiconductor phase transition pressures in relation to the fixed point pressure scale

TL;DR: A diamond-anvil type optical cell of improved design has produced static pressures in gasketed samples up to 500 kilobar as measured by the ruby fluorescence technique as discussed by the authors.
Journal ArticleDOI

Quantum Dielectric Theory of Electronegativity in Covalent Systems. III. Pressure-Temperature Phase Diagrams, Heats of Mixing, and Distribution Coefficients

TL;DR: In this paper, a two-band model was proposed to describe and predict the ionization potentials and electronic interband gaps of binary compounds and their alloys, and a revised method of calculating the excess heat of mixing of a substitutional alloy was presented.
Journal ArticleDOI

The α-γ transition in cerium is a Mott transition

TL;DR: In this article, it was shown that the intra-atomic interaction in cerium is considerably smaller than seems to have been believed in the past, and it is argued that in metallic cerium, U is only of the order of a few electron volts.
Journal ArticleDOI

Phases of silicon at high pressure

TL;DR: In this paper, X-ray diffraction studies on silicon at pressures up to 250 kbar (25 GPa) were conducted and the structure of the β-Sn structure was tentatively assigned as primitive hexagonal with c / a = 0.941 ± 0.002 at 250 k bar.
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The system MgO-FeO-SiO2 at high pressures and temperatures — phase equilibria and elastic properties

TL;DR: Ritsema et al. as mentioned in this paper presented a phase diagram for the MgSiO3-FeSiO4-SiO2 system at 800 and 1,000°C.
References
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Journal ArticleDOI

Apparatus for Optical Studies to Very High Pressures

TL;DR: In this paper, an apparatus has been developed in two stages which permits optical studies to 200, 000 atmospheres pressure, using NaCl windows and a press suitable to fit in a spectrometer.
Journal ArticleDOI

Apparatus for X‐Ray Measurements at Very High Pressure

TL;DR: In this paper, an apparatus was developed which permits x-ray powder patterns to be obtained to over 500 kilobars presure using a supported tapered piston electrical resistance apparatus.
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