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Synthesis of Diamond Thin Films by Thermal CVD Using Organic Compounds

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TLDR
Diamond thin films have been formed by thermal chemical vapor deposition (thermal CVD) using the organic compounds such as CH3OH, C2H5OH, CH3COCH3 C2h5OC 2H5, and (CH3)3N as mentioned in this paper.
Abstract
Diamond thin films have been formed by thermal chemical vapor deposition (thermal CVD) using the organic compounds such as CH3OH, C2H5OH, CH3COCH3 C2H5OC2H5, and (CH3)3N. The films are grown on the silicon substrates with high growth rate (8?10 ?m/h) under the pressure ranging 1?800 Torr. This growth rate is ten or several ten times faster than the CVD method using hydrocarbons such as CH4 and C2H2. The films have good crystallinity and high quality in the sense of electron diffraction and Raman spectrum. The Vicker's hardness of the film is about 10000 kg/mm2 and the gravity of that is about 3.52 g/cm3.

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Journal ArticleDOI

Diamond—Ceramic Coating of the Future

TL;DR: On etudie le depot chimique en phase vapeur et la croissance cristalline de revetement de diamant as mentioned in this paper, etudies le depot chambre et le departement chimique.
Journal ArticleDOI

Towards a general concept of diamond chemical vapour deposition

TL;DR: In this paper, a C H O phase diagram is introduced providing a common scheme for all major diamond chemical vapour deposition (CVD) methods used to date, revealing that low pressure diamond synthesis is only feasible within a well-defined field of the phase diagram, a diamond domain that allows general predictions of gas phase compositions and starting materials suitable for diamond synthesis.
Journal ArticleDOI

Growth mechanism of vapor-deposited diamond

TL;DR: In this paper, an elementary reaction mechanism of diamond growth by a vapor deposition process is proposed, which is consistent with the macroscopic views of the Russian researchers and is in general agreement with the numerous experimental observations reported in the literature.
Journal ArticleDOI

High rate synthesis of diamond by dc plasma jet chemical vapor deposition

TL;DR: In this paper, the first successful attempt at synthesizing diamond by chemical vapor deposition with the use of a dc plasma jet was described, and the growth rate of the diamond film was 80 μm/h.
Journal ArticleDOI

Nonoxidative Activation of Methane

TL;DR: In this article, the authors focus on the range of issues dealing with thermal and catalytic decomposition of methane that have been addressed in the last few years and provide a review of these issues.
References
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The Properties of Diamond

Journal ArticleDOI

Ion‐Beam Deposition of Thin Films of Diamondlike Carbon

TL;DR: Ion beam deposition of insulating carbon thin films on room temperature substrates, considering transparency, index of refraction, insulating capacity, glass scratching ability, etc. as discussed by the authors.
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Vapor growth of diamond on diamond and other surfaces

TL;DR: In this article, the growth rate of homoepitaxial diamond films reached 1 μm/h at 1000°C; film properties were identical to those of bulk crystals.
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Diamond synthesis from gas phase in microwave plasma

TL;DR: In this paper, a crystal diamond predominantly composed of {100} and {111} faces was grown on a non-diamond substrate from a gaseous mixture of hydrogen and methane under microwave glow discharge conditions.
Journal ArticleDOI

Vapor Deposition of Diamond Particles from Methane

TL;DR: In this article, the structure of microcrystalline diamond deposits was identified by electron diffraction and Raman scattering, and cubo-octahedral or multiply-twinned crystals were obtained.
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