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Journal ArticleDOI

The Effect of Work Function Change on the Sputtering of Si+ from Oxidized Si Surfaces

Ming L Yu
- 01 Jan 1983 - 
- Vol. 1983, pp 67-70
TLDR
In this paper, the effect of Li deposition on the sputtering of Si+ from oxygenated Si surfaces has been studied and it is observed that at low oxygen coverages, the Si+ yield decreases exponentially with the Li induced decrease of the work function.
Abstract
The effect of Li deposition on the sputtering of Si+ from oxygenated Si surfaces has been studied. It is observed that at low oxygen coverages, the Si+ yield decreases exponentially with the Li induced decrease of the work function . With the formation of thermally grown silicon oxide on the surface, the Si+ yield deviates from the simple exponential dependence on . The Si+ yield becomes independent of for an appreciable range of in cases of heavier oxidation.

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Citations
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Journal ArticleDOI

Mechanisms of atomic ion emission during sputtering

TL;DR: In this article, the authors summarized several major experimental and theoretical findings made in the last few years on the mechanisms of secondary ion emission and concluded that the phenomena can be divided into two categories: ion emission from the surfaces of metals and semiconductors tends to have a strong correlation with the work function and can be described quite well with an electron tunneling model.
Journal ArticleDOI

Chemical enhancement effects in SIMS analysis

TL;DR: In this paper, the authors summarized some of the recent advances in the understanding of the secondary ion emission process, and related them to the important cesium and oxygen enhancement effects in secondary ion mass spectrometry (SIMS).
Book ChapterDOI

Charged and excited states of sputtered atoms

Ming L. Yu
TL;DR: In this paper, the authors summarize the recent experimental and theoretical developments that have shed much light on the ionization mechanisms and present a present understanding of the excitation process for sputtered atom ionization and excitation.
Journal ArticleDOI

The Theory of Ionization Probability in Sputtering

N D Lang, +1 more
- 01 Jan 1983 - 
TL;DR: In this paper, a simple derivation of the ionization probability P− for negative ions sputtered off a metal surface is given, and the result P− ≈ e−(−A)/cv⊥ shows the experimentally observed dependences on work function, atomic affinity A, and outwards velocity v. The physical picture behind the process is discussed.
Journal ArticleDOI

Quantitative study of oxygen enhancement of sputtered ion yields. I. Argon ion bombardment of a silicon surface with O2 flood

TL;DR: In this paper, a novel quantification approach is applied to determine in situ the amount of surface oxygen within the sputtered particle escape depth during steady-state sputter depth profiling of silicon under simultaneous oxygenation with an oxygen flood gas or with a primary ion beam.
References
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Journal ArticleDOI

Direct Evidence of Electron Tunneling in the Ionization of Sputtered Atoms

TL;DR: In this article, strong neutralization of sputtered Cs/sup +/ ions is observed whenever the tunneling channel is opened by changing the surface work function so that a crossing of the Fermi level by the Cs 6s level occurs.
Journal ArticleDOI

Electron orbital energies of oxygen adsorbed on silicon surfaces and of silicon dioxide

H. Ibach, +1 more
- 15 Jul 1974 - 
TL;DR: In this paper, the electronic structures of oxygen adsorbed on silicon have been investigated by combining electron energy-loss spectroscopy (ELS) and ultraviolet photoemission spectrography (UPS).
Journal ArticleDOI

Work-function dependence of negative-ion production during sputtering

Ming L. Yu
TL;DR: In this article, a systematic study was made to negative ion formation by sputtering from a Mo(100) surface with and without adsorbate layers, and tunnel barrier widths and heights were estimated for Mo/sup -/, O/sup-/, H/sup-, and D/sup −/ from the experimental data.
Journal ArticleDOI

Coadsorption of electropositive and electronegative elements: II. Cs and O2 on W (100)

TL;DR: In this article, a systematic experimental study of Cs and Cs-H 2 adsorption on W (100) surfaces by LEED and work function measurements has been made.