Journal ArticleDOI
Ultrahigh resolution of calixarene negative resist in electron beam lithography
TLDR
In this paper, a nonpolymer material, calixarene derivative (hexaacetate p‐methnylcalix[6]arene) was tested as a high-resolution negative resist under an electron beam lithography process.Abstract:
A nonpolymer material, calixarene derivative (hexaacetate p‐methnylcalix[6]arene) was tested as a high‐resolution negative resist under an electron beam lithography process It showed under 10‐mm resolution with little side roughness and high durability to halide plasma etching A sub‐10‐nm Ge quantum wire was perfectly etched off without defects Such a performance is suitable for nanoscale device processesread more
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Journal ArticleDOI
Organic materials for electronic and optoelectronic devices
TL;DR: In this paper, the synthesis, properties, functions and potential applications for electronic and optoelectronic devices of photo-and electro-active organic materials are discussed, including amorphous molecular materials, titanyl phthalocyanine, oligothiophenes with well-defined structures, and non-conjugated polymers containing pendant oligothophenes or other π-electron systems.
Journal ArticleDOI
Directed assembly of block copolymer blends into nonregular device-oriented structures.
Mark P. Stoykovich,Marcus Müller,Sang Ouk Kim,Harun H. Solak,Erik Edwards,Juan J. de Pablo,Paul F. Nealey +6 more
TL;DR: Ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays are directed to assemble into nonregular device-oriented structures on chemically nanopatterned substrates for defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk.
Journal ArticleDOI
Photo- and electroactive amorphous molecular materials—molecular design, syntheses, reactions, properties, and applications
TL;DR: In this article, the recent progress of studies on photo-and electroactive amorphous molecular materials, highlighting photochromic amorphus molecular materials and their use in organic EL devices is discussed.
Directed self-assembly of block copolymer blends into nonregular device-oriented structures
Mark P. Stoykovich,Marcus Müller,Sang Ouk Kim,Harun H. Solak,Erik W. Edwards,J. J. de Pablo,Paul F. Nealey +6 more
Journal ArticleDOI
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
Vitor R. Manfrinato,Lihua Zhang,Dong Su,Huigao Duan,Richard G. Hobbs,Eric A. Stach,Karl K. Berggren +6 more
TL;DR: This work investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope and achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist.