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This electrochemical approach offers a low-cost and efficient route to the fabrication of graphene based devices.
The proposed graphene growth using air annealing technique is simple and low-cost, making it highly attractive for mass production.
Since the process does not require a clean room or lithography method, pure graphene optoelectronic devices can be manufactured at a low cost.
The capability of preparing crystalline graphene on a large scale with low cost opens an avenue for technological applications of graphene in many fields.
Graphene, even with imperfect layers, will be of great interest to battery industrial applications if the manufacturing cost is reduced.
Despite the availability of several production techniques, it is still a great challenge to achieve wafer-size graphene with acceptable uniformity and low cost, which would determine the future of graphene electronics.
Meanwhile, this high-yield production of graphene from low cost MWCNTs is important for the scalable synthesis and industrial application of graphene.
Thus, this technology has the potential to pave the way to many large-scale affordable applications of low-cost graphene feedstocks.
The fabrication process is fast, simple and low cost, making it ideal for scaling up to the industrial production levels needed for graphene to fulfil its commercial potential.
This green, safe, highly efficient and ultralow-cost approach paves the way to large-scale commercial applications of graphene.