B
Brian Bilenberg
Researcher at Technical University of Denmark
Publications - 46
Citations - 1282
Brian Bilenberg is an academic researcher from Technical University of Denmark. The author has contributed to research in topics: Nanoimprint lithography & Electron-beam lithography. The author has an hindex of 15, co-authored 43 publications receiving 1090 citations.
Papers
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Journal ArticleDOI
Lab-on-a-chip with integrated optical transducers
Søren Balslev,Anders M. Jorgensen,Brian Bilenberg,Klaus Bo Mogensen,Detlef Snakenborg,Oliver Geschke,Jörg Peter Kutter,Anders Kristensen +7 more
TL;DR: This work presents a feasibility study of a lab-on-a-chip system with five different components monolithically integrated on one substrate, the first time that integration of all these components has been demonstrated.
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PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated optics
TL;DR: An adhesive bonding technique for wafer-level sealing of SU-8 based lab-on-a-chip microsystems with integrated optical components is presented in this article, where the optical propagation loss of multi-mode 10 µm × 30 µm (width) waveguides is measured.
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VO2 Thermochromic Metamaterial-Based Smart Optical Solar Reflector
Kai Sun,Christoph A. Riedel,Alessandro Urbani,Mirko Simeoni,Sandro Mengali,Maksim Zalkovskij,Brian Bilenberg,C.H. de Groot,Otto L. Muskens +8 more
TL;DR: In this paper, a patterned thermo-chromic VO2 plasmonic meta-surface was used to improve the infrared absorption of a smart optical solar reflector.
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Metasurface Optical Solar Reflectors Using AZO Transparent Conducting Oxides for Radiative Cooling of Spacecraft
Kai Sun,Christoph A. Riedel,Yudong Wang,Alessandro Urbani,Mirko Simeoni,Sandro Mengali,Maksim Zalkovskij,Brian Bilenberg,C.H. de Groot,Otto L. Muskens +9 more
TL;DR: In this article, a metasurface-based approach using an Al-doped ZnO (AZO) transparent conducting oxide as infrared plasmonic material is presented.
Journal ArticleDOI
High resolution 100kV electron beam lithography in SU-8
Brian Bilenberg,Søren Jacobsen,Michael Stenbæk Schmidt,Lars Henrik Skjolding,P. Shi,Peter Bøggild,Jonas O. Tegenfeldt,Anders Kristensen +7 more
TL;DR: In this article, high resolution 100kV electron beam lithography in thin layers of the negative resist SU-8 is demonstrated, where sub-30nm lines with a pitch down to 300nm are written in 100nm-thick negative resist.