Journal ArticleDOI
High resolution 100kV electron beam lithography in SU-8
Brian Bilenberg,Søren Jacobsen,Michael Stenbæk Schmidt,Lars Henrik Skjolding,P. Shi,Peter Bøggild,Jonas O. Tegenfeldt,Anders Kristensen +7 more
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TLDR
In this article, high resolution 100kV electron beam lithography in thin layers of the negative resist SU-8 is demonstrated, where sub-30nm lines with a pitch down to 300nm are written in 100nm-thick negative resist.About:
This article is published in Microelectronic Engineering.The article was published on 2006-04-01. It has received 92 citations till now. The article focuses on the topics: X-ray lithography & Photolithography.read more
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SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
A. del Campo,Christian Greiner +1 more
TL;DR: The SU-8 photoresist has become the favourite photoreist for high-aspect-ratio (HAR) and three-dimensional (3D) lithographic patterning due to its excellent coating, planarization and processing properties as well as its mechanical and chemical stability as mentioned in this paper.
Journal ArticleDOI
Hierarchical Superhydrophobic Surfaces Fabricated by Dual‐Scale Electron‐Beam‐Lithography with Well‐Ordered Secondary Nanostructures
TL;DR: In this paper, a technique for fabricating macroscopic hierarchical superhydrophobic surfaces with both well-defi ned primary microstructures and well-ordered secondary nanostructures using electron-beam lithography is introduced.
Journal ArticleDOI
Ion transport in nanofluidic funnels.
TL;DR: In this article, the authors report fabrication of nanofluidic channels with asymmetric features (e.g., funnels) that were cast in high modulus poly(dimethylsiloxane) and had well-defined geometries and dimensions.
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Flexible fabrication and applications of polymer nanochannels and nanoslits
Rattikan Chantiwas,Sunggook Park,Steven A. Soper,Byoung Choul Kim,Shuichi Takayama,Vijaya Sunkara,Hyundoo Hwang,Yoon-Kyoung Cho +7 more
TL;DR: The opportunities afforded by polymer-based nanofluidics are discussed using both elastomeric and thermoplastic materials, and various fabrication modalities will be discussed along with the nanometre size domains that they can achieve for bothElastomer and therm Plastic materials.
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Stretching DNA in polymer nanochannels fabricated by thermal imprint in PMMA.
TL;DR: The extension of YOYO-1 stained T4 GT7 bacteriophage DNA inside the PMMA nanoch channels has been experimentally investigated using epi-fluorescence microscopy and results are in good agreement with results obtained by stretching DNA in conventional fused silica nanochannels.
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The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control
TL;DR: In this paper, the Black Silicon Method was used to find the processing conditions needed for a vertical wall in a Reactive Ion Etchers (RIE); two parallel plate reactors and a hexode.
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The dynamics of genomic-length DNA molecules in 100-nm channels
Jonas O. Tegenfeldt,Christelle N. Prinz,Han Cao,Stephen Y. Chou,Walter Reisner,Robert Riehn,Yan Mei Wang,Edward C. Cox,James C. Sturm,Pascal Silberzan,Robert H. Austin +10 more
TL;DR: It is shown that genomic-length DNA molecules imaged in nanochannels have an extension along the channel that scales linearly with the contour length of the polymer, in agreement with the scaling arguments developed by de Gennes for self-avoiding confined polymers.
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Micromachining applications of a high resolution ultrathick photoresist
Kam-Leung Lee,Nancy C. LaBianca,S. A. Rishton,S. Zolgharnain,J. D. Gelorme,Jane M. Shaw,Tai-Hon Philip Chang +6 more
TL;DR: In this paper, a negative tone photoresist, SU•8, was proposed for ultrathick layer applications, achieving an aspect ratio of 10:1 using near-ultraviolet lithography in a 200μm-thick layer.
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Improving stamps for 10 nm level wafer scale nanoimprint lithography
TL;DR: In this article, the authors demonstrate that the deposition procedure as well as the environment during deposition are important with respect to the quality and performance of the molecular layer of a polymer stamp and demonstrate that a stamp rich in small structures will effectively show a surface area enlargement, which leads to adhesion of the polymer to the stamp.
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PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated optics
TL;DR: An adhesive bonding technique for wafer-level sealing of SU-8 based lab-on-a-chip microsystems with integrated optical components is presented in this article, where the optical propagation loss of multi-mode 10 µm × 30 µm (width) waveguides is measured.