L
Lars Henrik Skjolding
Researcher at Lund University
Publications - 5
Citations - 205
Lars Henrik Skjolding is an academic researcher from Lund University. The author has contributed to research in topics: Photolithography & Electron-beam lithography. The author has an hindex of 4, co-authored 5 publications receiving 197 citations. Previous affiliations of Lars Henrik Skjolding include Technical University of Denmark.
Papers
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Journal ArticleDOI
High resolution 100kV electron beam lithography in SU-8
Brian Bilenberg,Søren Jacobsen,Michael Stenbæk Schmidt,Lars Henrik Skjolding,P. Shi,Peter Bøggild,Jonas O. Tegenfeldt,Anders Kristensen +7 more
TL;DR: In this article, high resolution 100kV electron beam lithography in thin layers of the negative resist SU-8 is demonstrated, where sub-30nm lines with a pitch down to 300nm are written in 100nm-thick negative resist.
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Chip Based Electroanalytical Systems for Cell Analysis
TL;DR: In this article, a review of chip-based amperometric and impedimetric cell analysis systems where measurements utilizing solely carbon fibre microelectrodes (CFME) and other non-chip electrode formats, such as CFME for exocytosis studies and scanning electrochemical microscopy (SECM) studies of living cells have been omitted.
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Characterisation of nano-interdigitated electrodes
TL;DR: In this paper, the authors used electron beam lithography to fabricate arrays of interdigitated electrodes with an electrode separation distance of 200 nm and an electrode finger width of likewise 200 nm.
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Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures
TL;DR: In this article, a mix-and-match process for aligning patterns created with nano-imprint lithography (NIL) and UV lithography is presented, which allows for the fabrication of large and small features in a single layer of resist.
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EBL/NIL fabrication and characterization of interdigitated electrodes for potential application in combinatorial studies.
TL;DR: In this paper, the authors used electron beam lithography (EBL) and nano-imprinting (NIL) to fabricate interdigitated electrodes for high throughput measurements and combinatorial experiments.