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Chia-Yuan Chang

Researcher at National Chiao Tung University

Publications -  21
Citations -  449

Chia-Yuan Chang is an academic researcher from National Chiao Tung University. The author has contributed to research in topics: High-electron-mobility transistor & Electron mobility. The author has an hindex of 5, co-authored 21 publications receiving 381 citations. Previous affiliations of Chia-Yuan Chang include Nippon Telegraph and Telephone & Yuan Ze University.

Papers
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Journal ArticleDOI

Coherent phonon manipulation in coupled mechanical resonators

TL;DR: In this article, it was shown that phonons can be coherently transferred between two nanomechanical resonators, and the technique of controlling the coupling between nanoscale oscillators using a piezoelectric transducer is useful for manipulating classical oscillations, but if extended to the quantum regime it could also enable entanglement of macroscopic mechanical objects.
Journal ArticleDOI

Investigation of Impact Ionization in InAs-Channel HEMT for High-Speed and Low-Power Applications

TL;DR: In this article, an 80-nm InP high electron mobility transistor (HEMT) with InAs channel and InGaAs subchannels has been fabricated, and DC and RF characterizations on the device have been performed to determine the proper bias conditions in avoidance of performance degradations due to the impact ionization.
Journal ArticleDOI

RF and Logic Performance Improvement of $ \hbox{In}_{0.7}\hbox{Ga}_{0.3}\hbox{As}/\hbox{InAs}/\hbox{In}_{0.7}\hbox{Ga}_{0.3}\hbox{As}$ Composite-Channel HEMT Using Gate-Sinking Technology

TL;DR: In this article, an 80-nanometer-gate In0.7Ga0.3As composite-channel high-electron mobility transistors (HEMTs), which are fabricated using platinum buried gate as the Schottky contact metal, were evaluated for RF and logic application.
Journal ArticleDOI

Effects of Wet Chemical and Trimethyl Aluminum Treatments on the Interface Properties in Atomic Layer Deposition of Al2O3 on InAs

TL;DR: In this paper, the reduction of native oxides on an InAs surface using various wet and dry chemical treatments, including HCl treatment, sulfide treatment, and in situ trimethyl aluminum (TMA) treatment before the atomic layer deposition (ALD) of Al2O3 on InAs is studied.
Proceedings ArticleDOI

InAs/In 1-x Ga x As Composite Channel High Electron Mobility Transistors for High Speed Applications

TL;DR: In this paper, the InAs/In0.7Ga0.3As composite channel HEMTs with different lattice matched sub-channels, In0.53Ga 0.47As and In 0.7 Ga0.5As, have been fabricated.