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Erwin Berenschot
Researcher at University of Twente
Publications - 106
Citations - 2482
Erwin Berenschot is an academic researcher from University of Twente. The author has contributed to research in topics: Etching (microfabrication) & Lithography. The author has an hindex of 24, co-authored 97 publications receiving 2256 citations. Previous affiliations of Erwin Berenschot include MESA+ Institute for Nanotechnology.
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Journal ArticleDOI
Silicon micromachined hollow microneedles for transdermal liquid transport
Han Gardeniers,Regina Luttge,Erwin Berenschot,M.J. de Boer,S.Y. Yeshurun,Meir Hefetz,R. van't Oever,A. van den Berg +7 more
TL;DR: In this article, an out-of-plane hollow microneedles are fabricated using a sequence of deep-reactive ion etching (DRIE), anisotropic wet etching and conformal thin film deposition.
Journal ArticleDOI
Silicon nitride nanosieve membrane
Hien D. Tong,Henri Jansen,Vishwas J. Gadgil,Cazimir G. Bostan,Erwin Berenschot,Cees J.M. van Rijn,Miko Elwenspoek +6 more
TL;DR: An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching as mentioned in this paper.
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Wet anisotropic etching for fluidic 1D nanochannels
TL;DR: In this paper, a method is proposed to fabricate channels for fluidic applications with a depth in the nanometer range by etching shallow trenches into langle110rangle silicon using native oxide as a mask material and OPD resist developer as the etchant.
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Spatial decoupling of light absorption and catalytic activity of Ni–Mo-loaded high-aspect-ratio silicon microwire photocathodes
Wouter Vijselaar,Pieter Westerik,Janneke Veerbeek,Roald M. Tiggelaar,Erwin Berenschot,Niels Roelof Tas,Han Gardeniers,Jurriaan Huskens +7 more
TL;DR: In this paper, the contribution of catalysts and light absorption to the overall performance of Si microwires was explored, depositing Ni-molybdenum catalysts spatioselectively to optimize efficiency.
Journal ArticleDOI
Selective area growth and stencil lithography for in situ fabricated quantum devices
Peter Schüffelgen,Daniel Rosenbach,Chuan Li,Tobias W. Schmitt,Tobias W. Schmitt,Michael Schleenvoigt,Abdur Rehman Jalil,Sarah Schmitt,Jonas Kölzer,Meng Wang,Meng Wang,Benjamin Bennemann,Umut Parlak,Lidia Kibkalo,Stefan Trellenkamp,Thomas Grap,Doris Meertens,Martina Luysberg,Gregor Mussler,Erwin Berenschot,Niels Roelof Tas,Alexander A. Golubov,Alexander Brinkman,Thomas Schäpers,Detlev Grützmacher +24 more
TL;DR: An in situ only fabrication process for networks of topological insulator–superconductor Josephson junctions with high interface transparency is introduced, which holds some potential for the production of future topological quantum computing networks.