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Ivan Gueorguiev Ivanov
Researcher at Linköping University
Publications - 235
Citations - 4906
Ivan Gueorguiev Ivanov is an academic researcher from Linköping University. The author has contributed to research in topics: Photoluminescence & Graphene. The author has an hindex of 34, co-authored 235 publications receiving 4207 citations. Previous affiliations of Ivan Gueorguiev Ivanov include Pierre-and-Marie-Curie University & RMIT University.
Papers
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Vibrational properties and structure of undoped and Al-doped ZnO films deposited by RF magnetron sputtering
Marian Tzolov,N Tzenov,D. Dimova-Malinovska,M. Kalitzova,C. Pizzuto,Gianfranco Vitali,Giuseppe Zollo,Ivan Gueorguiev Ivanov +7 more
TL;DR: In this paper, the most intensive band in the Raman spectra at approximately 570 cm−1 has been assigned to electric field-induced Raman scattering on longitudinal optical phonons.
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High-fidelity spin and optical control of single silicon-vacancy centres in silicon carbide
Roland Nagy,Matthias Niethammer,Matthias Widmann,Yu-Chen Chen,Péter Udvarhelyi,Péter Udvarhelyi,Cristian Bonato,Jawad ul Hassan,Robin Karhu,Ivan Gueorguiev Ivanov,Nguyen Tien Son,Jeronimo R. Maze,Takeshi Ohshima,Öney O. Soykal,Adam Gali,Adam Gali,Sang-Yun Lee,Florian Kaiser,Jörg Wrachtrup +18 more
TL;DR: High-fidelity optical initialization and coherent spin control are demonstrated, which are exploited to show coherent coupling to single nuclear spins with ∼1 kHz resolution and makes this defect a prime candidate for realising memory-assisted quantum network applications using semiconductor-based spin-to-photon interfaces and coherently coupled nuclear spins.
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Annealing effects on optical properties of low temperature grown ZnO nanorod arrays
TL;DR: In this paper, a two-step chemical bath deposition method was used to produce well-aligned ZnO nanorods on Si substrates and the structure and optical properties of the grown nanorod were investigated.
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Growth of SiC by Hot-Wall CVD and HTCVD
Olof Kordina,Christer Hallin,Anne Henry,J. P. Bergman,Ivan Gueorguiev Ivanov,Alexsandre Ellison,Nguyen Tien Son,Erik Janzén +7 more
TL;DR: In this paper, a hot-wall type susceptor is proposed for the growth of high-quality epitaxial SiC films, which shows promising results in terms of high quality material grown at high growth rates.
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High temperature chemical vapor deposition of SiC
Olle Kordina,Christer Hallin,Alexsandre Ellison,Andrey Bakin,Ivan Gueorguiev Ivanov,Anne Henry,Rositza Yakimova,M. Touminen,A. Vehanen,E. Janzén +9 more
TL;DR: In this paper, a high temperature chemical vapor deposition (HTCVD) was used for the epitaxial growth of silicon carbide and the growth rate was shown to be in the order of several tens of μm/h to 0.5 mm/h.