J
J. Trey Diulus
Researcher at Oregon State University
Publications - 16
Citations - 271
J. Trey Diulus is an academic researcher from Oregon State University. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Oxide. The author has an hindex of 6, co-authored 14 publications receiving 134 citations. Previous affiliations of J. Trey Diulus include Paul Scherrer Institute & University of Zurich.
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Journal ArticleDOI
Amorphization mechanism of SrIrO3 electrocatalyst: How oxygen redox initiates ionic diffusion and structural reorganization
Gang Wan,John W. Freeland,Jan Kloppenburg,Guido Petretto,Jocienne N. Nelson,Ding-Yuan Kuo,Cheng-Jun Sun,Jianguo Wen,J. Trey Diulus,Gregory S. Herman,Yongqi Dong,Yongqi Dong,Ronghui Kou,Jingying Sun,Shuo Chen,Kyle Shen,Darrell G. Schlom,Darrell G. Schlom,Gian-Marco Rignanese,Geoffroy Hautier,Dillon D. Fong,Zhenxing Feng,Hua Zhou,Jin Suntivich +23 more
TL;DR: In this paper, the authors investigated the structural evolution of the oxygen evolution reaction (OER) of the SrIrO3 OER electrocatalyst and showed that the structural reorganization facilitated by coupled ionic diffusions is essential to the disordered structure of the OER.
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Alkyltin Keggin Clusters Templated by Sodium
Sumit Saha,Deok-Hie Park,Danielle C. Hutchison,Morgan R. Olsen,Lev N. Zakharov,Lev N. Zakharov,David A. Marsh,David A. Marsh,Sara Goberna-Ferrón,Ryan T. Frederick,J. Trey Diulus,Nizan Kenane,Gregory S. Herman,Darren W. Johnson,Douglas A. Keszler,May Nyman +15 more
TL;DR: SAXS, NMR, and ESI MS differentiate β-NaSn13, Sn12, and other clusters present in crude "n-BuSnOOH" and highlight the role of Na as a template for alkyltin Keggin clusters.
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Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist
TL;DR: Mechanistic information is provided that can be applied to organotin EUV photoresists, where a significant increase in photoresist sensitivity may be obtained by varying the ambient conditions during EUV exposures.
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Thermal and radiation chemistry of butyltin oxo hydroxo: A model inorganic photoresist
Ryan T. Frederick,Sumit Saha,J. Trey Diulus,Feixiang Luo,Jenn M. Amador,Mengjun Li,Deok-Hie Park,Eric Garfunkel,Douglas A. Keszler,Gregory S. Herman +9 more
TL;DR: In this article, the thermal and radiation chemistry of an organotin-based model photoresist was investigated to elucidate patterning mechanisms related to extreme ultraviolet (EUV) lithography.
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Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography
J. Trey Diulus,Ryan T. Frederick,Danielle C. Hutchison,Igor Lyubinetsky,Rafik Addou,May Nyman,Gregory S. Herman +6 more
TL;DR: In this article, a solution-based organometallic nanoclusters are used as precursors due to their ability to precisely control their size, shape, structure, and assembly.