Journal ArticleDOI
Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist
TLDR
Mechanistic information is provided that can be applied to organotin EUV photoresists, where a significant increase in photoresist sensitivity may be obtained by varying the ambient conditions during EUV exposures.Abstract:
Organotin photoresists have shown promise for next-generation lithography because of their high extreme ultraviolet (EUV) absorption cross sections, their radiation sensitive chemistries, and their ability to enable high-resolution patterning. To better understand both temperature- and radiation-induced reaction mechanisms, we have studied a model EUV photoresist, which consists of a charge-neutral butyl-tin cluster. Temperature-programmed desorption (TPD) showed very little outgassing of the butyl-tin resist in ultrahigh vacuum and excellent thermal stability of the butyl groups. TPD results indicated that decomposition of the butyl-tin resist was first order with a fairly constant decomposition energy between 2.4 and 3.0 eV, which was determined by butyl group desorption. Electron-stimulated desorption (ESD) showed that butyl groups were the primary decomposition product for electron kinetic energies expected during EUV exposures. X-ray photoelectron spectroscopy was performed before and after low-energy electron exposure to evaluate the compositional and chemical changes in the butyl-tin resists after interaction with radiation. The effect of molecular oxygen during ESD experiments was evaluated, and it was found to enhance butyl group desorption during exposure and resulted in a significant increase in the ESD cross section by over 20%. These results provide mechanistic information that can be applied to organotin EUV photoresists, where a significant increase in photoresist sensitivity may be obtained by varying the ambient conditions during EUV exposures.read more
Citations
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Journal ArticleDOI
Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography
Ivan Bespalov,Yu Zhang,Jarich Haitjema,Rudolf M. Tromp,Rudolf M. Tromp,Sense Jan van der Molen,Albert M. Brouwer,Johannes Jobst,Sonia Castellanos +8 more
TL;DR: A simplified reaction model is proposed where the resist undergoes sequential chemical reactions, first yielding a sparsely cross-linked network, then a more densely cross- linked network, and this model is consistent with the observed EUV-sensitivity of tin-oxo cages.
Journal ArticleDOI
Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
Lianjia Wu,Ivan Bespalov,Katharina Witte,Olivier Lugier,Jarich Haitjema,Michaela Vockenhuber,Yasin Ekinci,Benjamin Watts,Albert M. Brouwer,Sonia Castellanos +9 more
TL;DR: In this article, the sensitivity to extreme-ultraviolet (EUV) radiation of zirconium oxo clusters with methacrylate ligands is substantially enhanced when a small fraction of the ligands are replaced by trifluoromethylacrylates.
Journal ArticleDOI
Organotin Carboxylate Reagents for Nanopatterning: Chemical Transformations during Direct-Write Electron Beam Processes
Meredith C. Sharps,Ryan T. Frederick,Madison L. Javitz,Gregory S. Herman,Darren W. Johnson,James E. Hutchison +5 more
TL;DR: In this paper, three organotin carboxylate species stabilized by the same ligands, but varying in size and structure, were studied to elucidate the effects of the structure on reactivity.
Journal ArticleDOI
Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography
J. Trey Diulus,Ryan T. Frederick,Danielle C. Hutchison,Igor Lyubinetsky,Rafik Addou,May Nyman,Gregory S. Herman +6 more
TL;DR: In this article, a solution-based organometallic nanoclusters are used as precursors due to their ability to precisely control their size, shape, structure, and assembly.
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A Bright Idea
TL;DR: In this article, a project designed to evaluate laboratory simulation studies and field demonstration that tested the effectiveness of taxiway centerline lighting scheme color pattern was presented. But, the results showed that the proposed modification did not impact aircraft taxi speed.
References
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