J
Jason DePonte
Researcher at Lawrence Berkeley National Laboratory
Publications - 4
Citations - 67
Jason DePonte is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Photomask. The author has an hindex of 3, co-authored 4 publications receiving 58 citations.
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Proceedings ArticleDOI
Commissioning an EUV mask microscope for lithography generations reaching 8 nm
Kenneth A. Goldberg,Iacopo Mochi,Markus P. Benk,Arnaud P. Allezy,M.R. Dickinson,Carl Cork,Daniel Zehm,James Macdougall,Erik H. Anderson,Farhad Salmassi,W. Chao,Vamsi Vytla,Eric M. Gullikson,Jason DePonte,M. S. Gideon Jones,Douglas Van Camp,Jeffrey F. Gamsby,William B. Ghiorso,Hanjing Huang,William Cork,Elizabeth Martin,Eric Van Every,Eric Acome,Veljko Milanovic,Rene Delano,Patrick P. Naulleau,Senajith Rekawa +26 more
TL;DR: The SEMATECH High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, EUV-wavelength microscope, dedicated to photomask imaging, now being commissioned at Lawrence Berkeley National Laboratory.
Proceedings ArticleDOI
The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope
Kenneth A. Goldberg,Iacopo Mochi,Markus P. Benk,Chihcheng Lin,Arnaud P. Allezy,M.R. Dickinson,Carl Cork,James Macdougall,Erik H. Anderson,Weilun Chao,Farhad Salmassi,Eric M. Gullikson,Daniel Zehm,Vamsi Vytla,William Cork,Jason DePonte,Gino Picchi,Ahmet Pekedis,Takeshi Katayanagi,Michael S. Jones,Elizabeth Martin,Patrick P. Naulleau,Senajith Rekawa +22 more
TL;DR: The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a newly commissioned,synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research as mentioned in this paper.
Proceedings ArticleDOI
Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
Christopher N. Anderson,Arnaud P. Allezy,Weilun Chao,Carl Cork,Will Cork,Rene Delano,Jason DePonte,M.R. Dickinson,Geoff Gaines,Jeff Gamsby,Eric M. Gullikson,Gideon Jones,Stephen Meyers,Ryan Miyakawa,Patrick P. Naulleau,Senajith Rekawa,Farhad Salmassi,Brandon Vollmer,Daniel Zehm,Wenhua Zhu +19 more
TL;DR: A 0.5-NA extreme ultraviolet micro-field exposure tool has been installed and commissioned at beamline 12.4 of the Advanced Light Source synchrotron facility at Lawrence Berkeley National Laboratory as discussed by the authors.
How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
Christopher L. Anderson,Arnaud P. Allezy,Weilun Chao,Lucas Conley,Carl Cork,Will Cork,Rene Delano,Jason DePonte,M.R. Dickinson,Geoff Gaines,Jeff Gamsby,Eric M. Gullikson,Gideon Jones,Lauren McQuade,Ryan Miyakawa,Patrick P. Naulleau,Seno Rekawa,Farhad Salmassi,Brandon Vollmer,Daniel Zehm,Wenhua Zhu +20 more
TL;DR: In this article, the Fourier synthesis pupil scanner mirror was replaced with a Fourier synthesized pupil scanner and the vibration levels in MET5 exposures were reduced from 1.5 nm to 0.8 nm RMS by tuning the vibration isolation system and removing non compliant hardware.