S
Senajith Rekawa
Researcher at Lawrence Berkeley National Laboratory
Publications - 48
Citations - 1301
Senajith Rekawa is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Extreme ultraviolet. The author has an hindex of 17, co-authored 48 publications receiving 1241 citations.
Papers
More filters
Journal ArticleDOI
Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy
TL;DR: Testing of the zone plate with the full-field transmission x-ray microscope, XM-1, in Berkeley, showed that the lens clearly resolved 12 nm lines and spaces, a significant step towards 10 nm resolution and beyond.
Journal ArticleDOI
Real space soft x-ray imaging at 10 nm spatial resolution.
Weilun Chao,Peter Fischer,Tolek Tyliszczak,Senajith Rekawa,Erik H. Anderson,Patrick P. Naulleau +5 more
TL;DR: Using Fresnel zone plates made with robust nanofabrication processes, the authors achieved 10 nm spatial resolution with soft x-ray microscopy using a conventional full-field and scanning soft X-ray microscope, marking a significant step forward in extending the microscopy to truly nanoscale studies.
Journal ArticleDOI
Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy.
Pascal Mercère,Philippe Zeitoun,Mourad Idir,Sébastien Le Pape,Denis Douillet,Xavier Levecq,Guillaume Dovillaire,Samuel Bucourt,Kenneth A. Goldberg,Patrick P. Naulleau,Senajith Rekawa +10 more
TL;DR: This report reports, for the first time to the authors' knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range using a spatially unfiltered incident beam to characterize a sensor.
Proceedings ArticleDOI
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
Patrick P. Naulleau,Kenneth A. Goldberg,Erik H. Anderson,Kevin Bradley,Rene Delano,Paul Denham,Bob Gunion,Bruce Harteneck,Brian Hoef,Hanjing Huang,Keith Jackson,Gideon Jones,Drew Kemp,James Alexander Liddle,Ron Oort,Al Rawlins,Senajith Rekawa,Farhad Salmassi,Ron Tackaberry,C. Chung,Layton C. Hale,D. W. Phillion,Gary E. Sommargren,John S. Taylor +23 more
TL;DR: In this paper, the Sematech Set-2 Micro Exposure Tool (MET) has been used for developmental micro-field printing at the Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory.
Journal ArticleDOI
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography.
Patrick P. Naulleau,Kenneth A. Goldberg,Phil Batson,Jeffrey Bokor,Paul Denham,Senajith Rekawa +5 more
TL;DR: A scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline is presented.