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Jérémie Grisolia

Researcher at University of Toulouse

Publications -  69
Citations -  1314

Jérémie Grisolia is an academic researcher from University of Toulouse. The author has contributed to research in topics: Ion implantation & Silicon. The author has an hindex of 17, co-authored 67 publications receiving 1241 citations. Previous affiliations of Jérémie Grisolia include Intelligence and National Security Alliance & Institut national des sciences appliquées.

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Growth mechanism of cavities in MeV helium implanted silicon

TL;DR: In this paper, a study of silicon implanted with 1.55 MeV helium 3 and thermally annealed to generate a subsurface cavity region was performed using neutron depth profiling and transmission electron microscopy (TEM).
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Small angle X-ray scattering coupled with in situ electromechanical probing of nanoparticle-based resistive strain gauges.

TL;DR: A comprehensive study on the electromechanical behavior of nanoparticle-based resistive strain gauges in action through normal and grazing incidence small angle X-ray scattering (SAXS/GISAXS) investigations is presented, suggesting a linear longitudinal extension and transversal contraction of the NP wires with applied strain.
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TEM studies of the defects introduced by ion implantation in SiC

TL;DR: In this paper, the defects formed by ion implantation in SiC for a large variety of experimental conditions were investigated and a statistical analysis of digital images was performed to extract the depth-distributions of the defects.
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Electro-mechanical sensing in freestanding monolayered gold nanoparticle membranes

TL;DR: A new class of highly sensitive nano-electro-mechanical systems based on freestanding monolayered gold NP membranes is evidences, which are attributed to the exponential dependence of the tunnel electron transport in 2D NP arrays on the strain-induced length variation of the interparticle junctions.
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Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

TL;DR: In this paper, a self-assembled monolayers have been grafted on micrometric and nanometric areas of SiO2∕Si substrates using a process combining nanoimprint lithography and atmospheric chemical vapor deposition.