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John L. Freeouf

Researcher at IBM

Publications -  100
Citations -  4081

John L. Freeouf is an academic researcher from IBM. The author has contributed to research in topics: Schottky barrier & Band gap. The author has an hindex of 32, co-authored 100 publications receiving 4003 citations. Previous affiliations of John L. Freeouf include Oregon Health & Science University & Portland State University.

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Patent

Intermediate passivation and cleaning of compound semiconductor surfaces

TL;DR: In this article, a GaAs crystal is provided with a surface layer of arsenic, formed by exposure to light having a photon energy greater than 1.8 eV, at a power density of 0.01 to 0.5 watts per cm2 while the GaAs immersed in a 1:1 HCl:H2 O solution for a period of 10-30 minutes.
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Optical characterization of 4H-SiC by far ultraviolet spectroscopic ellipsometry

TL;DR: In this article, a far UV spectroscopic ellipsometer system working up to 9 eV was developed and applied to the characterization of three 4H-SiC samples with different surface conditions.
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Spectroscopic studies of the electrical structure of transition metal and rare earth complex oxides

TL;DR: In this paper, the lowest conduction band states are derived from anti-bonding transition metal (Tm) and rare earth (Re) d*-states, and a method for obtaining independent control of band gap energies and dielectric constants in complex oxides, ReTmO 3, results from coupling of Tm and Re atom d-states bonded to the same oxygen atom.
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Reflection anisotropy spectroscopy, surface photovoltage spectroscopy, and contactless electroreflectance investigation of the InP/In0.53Ga0.47As(001) heterojunction system

TL;DR: In this paper, an ex situ investigation of the InP/In0.53Ga0.47As (001) heterojunction interface as a function of InP overlayer thickness (50-1000 nm) and the surfaces of n− and p−doped In0.
Patent

Semiconductor ballistic electron velocity control structure

TL;DR: In this article, a semiconductor device where an emitter material composition and doping profile produces an electron gas in a base adjacent a band offset heterojunction interface, the electrons in the gas in the base are confined under bias by a low barrier and the ballistic carriers have their kinetic energy controlled to prevent intervalley scattering by an electrostatic barrier that under influence of bias provides an essentially level conduction band in the portion of the base adjacent the collector.