scispace - formally typeset
K

Kevin D. Leedy

Researcher at Air Force Research Laboratory

Publications -  180
Citations -  4270

Kevin D. Leedy is an academic researcher from Air Force Research Laboratory. The author has contributed to research in topics: Thin film & Pulsed laser deposition. The author has an hindex of 31, co-authored 180 publications receiving 3443 citations. Previous affiliations of Kevin D. Leedy include University of Illinois at Urbana–Champaign & Air Force Institute of Technology.

Papers
More filters
Proceedings ArticleDOI

Model for thickness dependence of mobility and concentration in highly conductive ZnO

TL;DR: In this paper, the dependences of the 294-K and 10-K mobility μ and volume carrier concentration n on thickness (d = 25 − 147 nm) were examined in Al-doped ZnO (AZO) layers grown in Ar ambient at 200 °C on quartz-glass substrates.
Journal ArticleDOI

Optoelectronic performance enhancement in pulsed laser deposited gallium-doped zinc oxide (GZO) films after UV laser crystallization

TL;DR: In this paper, the authors investigated the process-microstructure-property relationship during a UV laser crystallization of a transparent conductive layer of gallium doped zinc oxide (GZO) films after pulsed laser deposition.
Journal ArticleDOI

Organic Solution Deposition of Copper Seed Layers onto Barrier Metals

TL;DR: In this article, a spontaneous deposition of copper seed layers from metal bearing organic based solutions onto sputter deposited titanium, titanium nitride, and tantalum diffusion barrier thin films has been demonstrated.
Journal ArticleDOI

Efficient broadband energy detection from the visible to near-infrared using a plasmon FET.

TL;DR: It is shown, using empirical data and simulation results, that detection loss exponentially increases as the volume of metal nanostructure increases and also a limited spectral response is possible using gold nanostructures in a plasmon to electric conversion device.
Proceedings ArticleDOI

Heterogeneous integration of low-temperature metal-oxide TFTs

TL;DR: In this article, a monolithically integrated cascode topology was used to couple a GaN HEMT's >200 V breakdown characteristic with the gate driving characteristic of an IGZO TFT, effectively shifting the GaN threshold voltage from -3 V to +1 V.