scispace - formally typeset
K

Kota V. R. M. Murali

Researcher at IBM

Publications -  59
Citations -  1272

Kota V. R. M. Murali is an academic researcher from IBM. The author has contributed to research in topics: Field-effect transistor & Transistor. The author has an hindex of 19, co-authored 59 publications receiving 1116 citations. Previous affiliations of Kota V. R. M. Murali include Massachusetts Institute of Technology & Indian Institute of Technology Kharagpur.

Papers
More filters
Journal ArticleDOI

Effect of Band-to-Band Tunneling on Junctionless Transistors

TL;DR: In this paper, the authors evaluate the impact of band-to-band tunneling on the characteristics of n-channel junctionless transistors (JLTs) and present guidelines to optimize the device for high on-tooff current ratio.
Journal ArticleDOI

A Tunnel FET for $V_{DD}$ Scaling Below 0.6 V With a CMOS-Comparable Performance

TL;DR: In this paper, a modified structure of tunnel field effect transistor (TFET), called the sandwich tunnel barrier FET (STBFET), has been proposed, which has a large tunneling cross-sectional area with a tunneling distance of ~2 nm.
Journal ArticleDOI

Probing decoherence with electromagnetically induced transparency in superconductive quantum circuits.

TL;DR: It is discussed how a superconductive analog to electromagnetically induced transparency can be used to establish macroscopic coherence in such systems and, thereby, be utilized as a sensitive probe of decoherence.
Journal ArticleDOI

Quantum-information processing by nuclear magnetic resonance: Experimental implementation of half-adder and subtractor operations using an oriented spin-7/2 system

TL;DR: In this paper, the use of a spin-7/2 as a three-qubit system and experimentally implementing the half-adder and subtractor operations is described. But labeling of quantum states of system can be suitably chosen to increase the efficiency of a computational task.
Journal ArticleDOI

CMOS Logic Device and Circuit Performance of Si Gate All Around Nanowire MOSFET

TL;DR: In this article, a detailed 3D numerical analysis is carried out to study and evaluate CMOS logic device and circuit performance of gate-all-around (GAA) Si nanowire (NW) field-effect transistors (FETs) operating in sub-22-nm CMOS technologies.