M
Mohit Bajaj
Researcher at GlobalFoundries
Publications - 198
Citations - 1355
Mohit Bajaj is an academic researcher from GlobalFoundries. The author has contributed to research in topics: Computer science & Engineering. The author has an hindex of 13, co-authored 53 publications receiving 676 citations. Previous affiliations of Mohit Bajaj include Synopsys & National Institute of Technology Delhi.
Papers
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Journal ArticleDOI
Effect of Band-to-Band Tunneling on Junctionless Transistors
Suresh Gundapaneni,Mohit Bajaj,Rajan K. Pandey,Kota V. R. M. Murali,Swaroop Ganguly,Anil Kottantharayil +5 more
TL;DR: In this paper, the authors evaluate the impact of band-to-band tunneling on the characteristics of n-channel junctionless transistors (JLTs) and present guidelines to optimize the device for high on-tooff current ratio.
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CMOS Logic Device and Circuit Performance of Si Gate All Around Nanowire MOSFET
Kaushik Nayak,Mohit Bajaj,Aniruddha Konar,Philip J. Oldiges,Kenji Natori,Hiroshi Iwai,Kota V. R. M. Murali,Valipe Ramgopal Rao +7 more
TL;DR: In this article, a detailed 3D numerical analysis is carried out to study and evaluate CMOS logic device and circuit performance of gate-all-around (GAA) Si nanowire (NW) field-effect transistors (FETs) operating in sub-22-nm CMOS technologies.
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Brownian dynamics simulation of polymer collapse in a poor solvent: influence of implicit hydrodynamic interactions
TL;DR: The effect of solvent on the collapse dynamics of homopolymers is investigated with Brownian dynamics simulations of a non-linear bead-spring chain model incorporating implicit hydrodynamic interactions, suggesting that the polymer collapse takes place via a three-stage mechanism, namely, formation of pearls, coarsening of Pearls and the formation of a compact globule.
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Carrier Transport in High Mobility InAs Nanowire Junctionless Transistors
Aniruddha Konar,John P. Mathew,Kaushik Nayak,Mohit Bajaj,Rajan K. Pandey,Sajal Dhara,Kota V. R. M. Murali,Mandar M. Deshmukh +7 more
TL;DR: High-mobility junctionless gate-all-around nanowire field effect transistor with carrier mobility reaching 2000 cm(2)/V·s at room temperature with key scattering mechanisms limiting the carrier transport in these nanowires is reported.
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Random Dopant Fluctuation Induced Variability in Undoped Channel Si Gate all Around Nanowire n-MOSFET
TL;DR: In this article, the random dopant fluctuation (RDF)-induced threshold voltage variability, on current variability, and mismatch in undoped channel Si gate-all-around (GAA) n-nanowire MOSFETs were studied using coupled 3-D statistical device simulations considering quantum corrected room temperature drift-diffusion transport.