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Lei Wan

Researcher at Western Digital

Publications -  55
Citations -  2858

Lei Wan is an academic researcher from Western Digital. The author has contributed to research in topics: Lithography & Copolymer. The author has an hindex of 25, co-authored 53 publications receiving 2603 citations. Previous affiliations of Lei Wan include Max Planck Society & Wisconsin Alumni Research Foundation.

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Nanoscale chemical imaging by photoinduced force microscopy

TL;DR: Infrared photoinduced force microscopy has demonstrated the ability to spatially map nm-scale patterns of the individual chemical components of two different types of self-assembled block copolymer films, and provides a powerful new analytical method for deepening the understanding of nanomaterials.
Patent

Imprint mold and method for making using sidewall spacer line doubling

TL;DR: In this paper, a method for making an imprint mold uses sidewall spacer line doubling, but without the need to transfer the sidewal spacer patterns into the mold substrate, and the resulting mold is a substrate with pillars of sidewall spacers patterned as stripes and extending from the substrate.
Journal ArticleDOI

Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

TL;DR: Directed self-assembly of block copolymers (BCPs) on chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage.
Patent

Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis

TL;DR: In this paper, a method for making a chemical contrast pattern using directed self-assembly of block copolymers and sequential infiltration synthesis (SIS) of an inorganic material is presented.