L
Lei Wan
Researcher at Western Digital
Publications - 55
Citations - 2858
Lei Wan is an academic researcher from Western Digital. The author has contributed to research in topics: Lithography & Copolymer. The author has an hindex of 25, co-authored 53 publications receiving 2603 citations. Previous affiliations of Lei Wan include Max Planck Society & Wisconsin Alumni Research Foundation.
Papers
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Journal ArticleDOI
Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Thomas R. Albrecht,Hitesh Arora,Vipin Ayanoor-Vitikkate,J.-M. L. Beaujour,Daniel Bedau,David Berman,Alexei Bogdanov,Yves-Andre Chapuis,Julia D. Cushen,E. Dobisz,Gregory S. Doerk,He Gao,Michael Grobis,Bruce A. Gurney,Weldon Mark Hanson,Olav Hellwig,Toshiki Hirano,Pierre-Olivier Jubert,Dan S. Kercher,Jeffrey S. Lille,Zuwei Liu,C. Mathew Mate,Yuri N. Obukhov,Kanaiyalal C. Patel,Kurt A. Rubin,Ricardo Ruiz,Manfred Ernst Schabes,Lei Wan,Dieter Weller,Tsai-Wei Wu,En Yang +30 more
TL;DR: In this article, a bit-patterned media (BPM) fabrication method was proposed for magnetic data recording at > 1 Tb/in 2 and circumvents many of the challenges associated with extending conventional granular media technology.
Journal ArticleDOI
Nanoscale chemical imaging by photoinduced force microscopy
Derek Nowak,William Morrison,H. Kumar Wickramasinghe,Junghoon Jahng,Eric O. Potma,Lei Wan,Ricardo Ruiz,Thomas R. Albrecht,Kristin Schmidt,Jane Frommer,Daniel P. Sanders,Sung Park +11 more
TL;DR: Infrared photoinduced force microscopy has demonstrated the ability to spatially map nm-scale patterns of the individual chemical components of two different types of self-assembled block copolymer films, and provides a powerful new analytical method for deepening the understanding of nanomaterials.
Patent
Imprint mold and method for making using sidewall spacer line doubling
He Gao,Jeffrey S. Lille,Lei Wan +2 more
TL;DR: In this paper, a method for making an imprint mold uses sidewall spacer line doubling, but without the need to transfer the sidewal spacer patterns into the mold substrate, and the resulting mold is a substrate with pillars of sidewall spacers patterned as stripes and extending from the substrate.
Journal ArticleDOI
Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
TL;DR: Directed self-assembly of block copolymers (BCPs) on chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage.
Patent
Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
TL;DR: In this paper, a method for making a chemical contrast pattern using directed self-assembly of block copolymers and sequential infiltration synthesis (SIS) of an inorganic material is presented.