M
Mahesh G. Samant
Researcher at IBM
Publications - 190
Citations - 14609
Mahesh G. Samant is an academic researcher from IBM. The author has contributed to research in topics: Thin film & Absorption spectroscopy. The author has an hindex of 52, co-authored 187 publications receiving 13499 citations. Previous affiliations of Mahesh G. Samant include Samsung.
Papers
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Journal ArticleDOI
Subnanosecond incubation times for electric-field-induced metallization of a correlated electron oxide
Justin S. Brockman,Li Gao,Brian M. Hughes,Charles T. Rettner,Mahesh G. Samant,Kevin P. Roche,Stuart S. P. Parkin +6 more
TL;DR: It is shown that in the canonical metal-to-insulator transition system V₂O₃, that ultrafast voltage pulses result in its metallization only after an incubation time that ranges from ∼150 ps to many nanoseconds, depending on the electric field strength.
Journal ArticleDOI
Giant reversible, facet-dependent, structural changes in a correlated-electron insulator induced by ionic liquid gating
Jaewoo Jeong,Nagaphani Aetukuri,Donata Passarello,Donata Passarello,Steven D. Conradson,Mahesh G. Samant,Stuart S. P. Parkin,Stuart S. P. Parkin +7 more
TL;DR: It is shown that the whole film undergoes giant, structural changes on gating in which the lattice expands by up to ∼3% near room temperature, in contrast to the 10 times smaller contraction when the system is thermally metallized.
Journal ArticleDOI
Formation of an ordered self-assembled monolayer of docosaneselenol on gold(111). Structure by surface x-ray diffraction
Patent
Magnetic tunnel junctions with improved tunneling magneto-resistance
TL;DR: In this article, the first layer is formed from at least one material selected from the group consisting of amorphous ferromagnetic material, amorphou ferrimagnetic materials, and non-magnetic materials.
Journal ArticleDOI
Suppression of Ionic Liquid Gate-Induced Metallization of SrTiO3(001) by Oxygen
Mingyang Li,Wei Han,Xin Jiang,Jaewoo Jeong,Jaewoo Jeong,Mahesh G. Samant,Stuart S. P. Parkin +6 more
TL;DR: It is shown that the metallization is strongly affected by the presence of oxygen gas introduced external to the device whereas argon and nitrogen have no effect.