P
Paul H. Holloway
Researcher at University College Cork
Publications - 351
Citations - 12991
Paul H. Holloway is an academic researcher from University College Cork. The author has contributed to research in topics: Thin film & Auger electron spectroscopy. The author has an hindex of 53, co-authored 346 publications receiving 11988 citations. Previous affiliations of Paul H. Holloway include University of Florida & University of York.
Papers
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ZnS:Cu,Al,Au phosphor degradation under electron excitation
TL;DR: In this paper, the surface degrades during prolonged electron bombardment and the growth of a non-luminescent ZnO surface layer is one reason leading to the degradation in cathodoluminescence intensity.
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CdS:Mn nanocrystals passivated by ZnS: Synthesis and luminescent properties
TL;DR: In this paper, the synthesis and characterization of highly luminescent ZnS-passivated CdS:Mn (CdS,Mn/ZnS) core/shell structured nanocrystals are reported.
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Controlled shape growth of Eu- or Tb-doped luminescent Gd2O3 colloidal nanocrystals.
TL;DR: The photoluminescence intensity from rare earth doped Gd(2)O(3) was shown to increase from nanoplates to nanospheres, which was discussed in terms of doping efficiency, crystal structure, and ratio of surface to volume.
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Progress in semiconducting oxide-based thin-film transistors for displays
Yiting Li,Y. W. Kwon,M. Jones,Young-Woo Heo,J. Zhou,Shyh-Chyang Luo,Paul H. Holloway,Elliot P. Douglas,David P. Norton,Z. V. Park,Shaofan Li +10 more
TL;DR: In this article, the fabrication and properties of ZnO-based thin-film transistors on glass are described and a low leakage current of 10−7 A cm−2 was achieved with amorphous HfO2 or (Ce, Tb)MgA11O19 as the gate dielectric.
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Comparison of Ni/Au, Pd/Au, and Cr/Au Metallizations for Ohmic Contacts to p-GaN
TL;DR: In this paper, the authors investigated the structural and electronic properties of thin films of Ni, Pd, and Cr/Au on p-GaN with a carrier concentration of 9.8 × 1016 cm−3 in terms of their as-deposited and following heat treatments up to 600°C (furnace anneals) and 900°c (RTA) in a flowing N2 ambient.