P
Philippe M. Fauchet
Researcher at Vanderbilt University
Publications - 494
Citations - 19231
Philippe M. Fauchet is an academic researcher from Vanderbilt University. The author has contributed to research in topics: Silicon & Porous silicon. The author has an hindex of 60, co-authored 494 publications receiving 18686 citations. Previous affiliations of Philippe M. Fauchet include Rochester Institute of Technology & AT&T.
Papers
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Journal ArticleDOI
Transport properties of α-Si, Ge:H alloys prepared from SiF4, GeF4 and H2 in R.F. or D.C. Glow discharges
James Kolodzey,D. Slobodin,S. Aljishi,S. Quinlan,R. Schwarz,D. S. Shen,Philippe M. Fauchet,Sigurd Wagner +7 more
TL;DR: In this article, the diffusion lengths of α-Si, Ge:H, F alloys with high Ge concentration have been observed with X-ray diffraction and Raman scattering.
Journal ArticleDOI
Optical and electronic properties of an amorphous silicon‐germanium alloy with a 1.28 eV optical gap
TL;DR: In this paper, the authors report the deposition and comprehensive evaluation of a hydrogenated, fluorinated amorphous silicon-germanium alloy with an optical gap of 1.28 eV.
Journal ArticleDOI
Ultra-low power modulators using MOS depletion in a high-Q SiO₂-clad silicon 2-D photonic crystal resonator.
TL;DR: This work shows that it is possible to create a fully oxide-clad microcavity with theoretical Q on the order of 10(5), and shows that by using MOS charge depletion this microc Cavity can be the basis for a modulator with a switching energy as low as 1 fJ/bit.
Book
Laser optics for intracavity and extracavity applications
TL;DR: In this paper, the authors present a survey of laser design requirements for high power lasers, modular optics, free-electron laser photoelectric injectors, liquid crystal optics for laser systems, nonlinear optical properties, and abrasion-resistant porous silica antireflective coatings.
Book ChapterDOI
Chapter 6 Porous Silicon: Photoluminescence and Electroluminescent Devices
TL;DR: In this article, the photoluminescence and electroluminescent devices of porous silicon are discussed, where the electron and hole must be located at the same point in the Brillouin zone, which is the case in direct gap semiconductors such as GaAs.