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Philippe M. Fauchet

Researcher at Vanderbilt University

Publications -  494
Citations -  19231

Philippe M. Fauchet is an academic researcher from Vanderbilt University. The author has contributed to research in topics: Silicon & Porous silicon. The author has an hindex of 60, co-authored 494 publications receiving 18686 citations. Previous affiliations of Philippe M. Fauchet include Rochester Institute of Technology & AT&T.

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Label-Free Optical Biosensor using Silicon Two- Dimensional Photonic Crystal

TL;DR: In this paper, the authors report the design, fabrication and testing of a label-free optical biosensor consisting of a two-dimensional photonic crystal microcavity, with an extremely small internal surface of <100 mum2.
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Influence of silicon dioxide capping layers on pore characteristics in nanocrystalline silicon membranes.

TL;DR: This work systematically studied the influence of the silicon dioxide capping layers on pnc-Si membranes and found the decrease of the pore size and porosity is correlated with the increased roughness of the bottom oxide layer, which hinders nanocrystal nucleation and nanopore formation.
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Electroluminescence from Er doped SiO 2 /nc-Si multilayers under lateral carrier injection

TL;DR: In this paper, a light emitting p-i-n diodes consisting of Er-doped SiO 2 /nc-Si multilayers and a novel electrical pumping geometry are demonstrated in forward bias.
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Integrated sensor arrays with a configurable network interface for chemical and biological detection

TL;DR: Sensors based on macroporous silicon (M-PSI) have demonstrated the ability to detect the presence of certain chemical and biological materials and an electrical response to DNA hybridization and shown discrimination between binding and non-binding events.
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Electroluminescence and carrier transport in LEDs based on silicon-rich silicon oxide

TL;DR: In this article, a prototype alphanumeric 7-segment display with an isolated version of the LEDs and standard microelectronic processing techniques was fabricated using thermal oxidation of electrochemically etched c-Si.