Ryan Deschner

TL;DR: The fidelity of VH:VL pairs identified by this approach were validated and the method was used to sequence the repertoire of three human cell subsets—peripheral blood IgG+ B cells, peripheral plasmablasts isolated after tetanus toxoid immunization and memory B cells isolated after seasonal influenza vaccination.

TL;DR: In this article, the authors used a spin-on hard mask underlayer material with high adhesion by reacting methacrylate groups of the underlayer to the acrylate group of resist material during ultraviolet irradiation.

TL;DR: In this article, a strong adhesion force between resist and underlayer materials was employed to reduce resist pattern peeling generated from de-molding in step-and-flash imprint lithography (SFIL), while simultaneously minimizing the adhesion forces between resist material and the template surface with fluorinated surfactants.

TL;DR: In this article, a spin-on UV-sensitive hard mask underlayer material with terminal methacrylate groups has been developed successfully, in order to obtain high adhesion by radical polymerisation between the resist and underlayer during UV irradiation.

TL;DR: In this article, a new type of binary mask blank consisting of an opaque layer of MoSi on a glass substrate, referred to simply as OMOG, was discussed and compared to a previous chrome/MoSi/glass binary intensity mask (BIM) blank.