Ulf Helmersson

TL;DR: In this article, the development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed, and the application of a secondary discharge, inductively coupled plasma magnetron (ICP-MS), microwave amplified magnetron, and self-sustained sputtering (SSS) is discussed as well as the hollow cathode magnetron discharges.

TL;DR: In this paper, the potential for high-aspect-ratio trench filling applications by high power pulsed magnetron sputtering is demonstrated by deposition in via-structures.

TL;DR: In this paper, single-crystal TiN/VN strained-layer superlattices with layer thicknesses ranging from 0.75 to 16 nm have been grown on MgO(100 ) substrates by reactive magnetron sputtering and cross-sectional transmission electron microscopy (TEM) and x-ray diffraction examinations showed that the films were single crystals exhibiting coherent interfaces and several orders of super-lattice reflections.

TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.

TL;DR: In this paper, the influence on thin film density using high power impulse magnetron sputtering (HIPIMS) was investigated for eight different target materials (Al, Ti, Cr, Zr, Ag, Ta, and Pt).