Ionized physical vapor deposition (IPVD): A review of technology and applications
TLDR
In this article, the development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed, and the application of a secondary discharge, inductively coupled plasma magnetron (ICP-MS), microwave amplified magnetron, and self-sustained sputtering (SSS) is discussed as well as the hollow cathode magnetron discharges.About:
This article is published in Thin Solid Films.The article was published on 2006-08-14 and is currently open access. It has received 972 citations till now. The article focuses on the topics: High-power impulse magnetron sputtering & Sputter deposition.read more
![Table II. The reaction rate coefficients for electron impact ionization of a few metal atoms and Ar (after Hopwood [2]).](/figures/table-ii-the-reaction-rate-coefficients-for-electron-impact-165yncyd.webp)
Citations
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Journal ArticleDOI
The Mn+1AXn phases: Materials science and thin-film processing
TL;DR: A critical review of the M(n + 1)AX(n) phases from a materials science perspective is given in this article, where the authors discuss the potential for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates.
Journal ArticleDOI
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Book
Handbook of physical vapor deposition (PVD) processing
TL;DR: Physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing is discussed in this paper.
Journal ArticleDOI
A structure zone diagram including plasma-based deposition and ion etching
TL;DR: In this article, an extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering.
Journal ArticleDOI
High power impulse magnetron sputtering discharge
TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.
References
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Book
CRC Handbook of Chemistry and Physics
TL;DR: CRC handbook of chemistry and physics, CRC Handbook of Chemistry and Physics, CRC handbook as discussed by the authors, CRC Handbook for Chemistry and Physiology, CRC Handbook for Physics,
Book
Principles of Plasma Discharges and Materials Processing
TL;DR: In this paper, the authors introduce the concept of particle and energy balance in discharges and introduce the theory of collision dynamics and wave-heated discharges, as well as chemical reactions and equilibrium.