V
V. Damodara Das
Researcher at Indian Institute of Technology Madras
Publications - 89
Citations - 1184
V. Damodara Das is an academic researcher from Indian Institute of Technology Madras. The author has contributed to research in topics: Thin film & Electrical resistivity and conductivity. The author has an hindex of 20, co-authored 89 publications receiving 1145 citations.
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Size and temperature dependence of electrical resistance and thermoelectric power of bi2te2se1 thin films
V. Damodara Das,S. Selvaraj +1 more
TL;DR: In this article, the thickness dependences of electrical resistivity and thermoelectric power of Bi2Te2Se1 of various thicknesses have been analyzed using the effective mean-free path model.
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Band gap and intergrain barrier activation energies in Bi90Sb10 thin films
V. Damodara Das,M.S. Jagadeesh +1 more
TL;DR: In this paper, electrical resistivity and Hall effect measurements have been made on vacuum evaporated Bi 90 Sb 10 alloy films of various thickness (350 A to 4500 A), in the temperature range of 77 to 510 K.
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Effect of applied field and temperature on the aging of copper discontinuous films studied by the repeated deposition technique
TL;DR: In this paper, the effect of an applied DC electric field on the post-deposition resistance changes of island copper films on glass was investigated and an agglomeration rate was defined with the theory of mobility coalescence being invoked to explain the resistance increase of the films after deposition.
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Study of structural-, compositional-, and thickness-dependent thermoelectric and electrical properties of Bi93Sb7 alloy thin films
TL;DR: In this paper, the thickness and temperature dependences of thermoelectric power and electrical resistivity have been analyzed and the negative temperature coefficient of resistivity confirmed that the material is semiconducting in nature.
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Effect of annealing and surface treatment on the efficiency of photoelectrochemical (PEC) solar cells with vacuum-deposited n-InSe thin film electrode
TL;DR: In this article, three hundred-nanometre thick films of n-InSe have been vacuum-deposited by flash evaporation on conducting indium oxide film coated clean glass substrates held at 373 K at 6.6 × 10−3 Pa pressure.