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X. D. Chen

Researcher at University of Hong Kong

Publications -  21
Citations -  391

X. D. Chen is an academic researcher from University of Hong Kong. The author has contributed to research in topics: Deep-level transient spectroscopy & Ion implantation. The author has an hindex of 10, co-authored 21 publications receiving 381 citations. Previous affiliations of X. D. Chen include Guangdong University of Technology.

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Current transport studies of ZnO/p-Si heterostructures grown by plasma immersion ion implantation and deposition

TL;DR: In this article, undoped and nitrogen-doped ZnO films were fabricated by plasma immersion ion implantation and deposition, and the transport properties of the undoped-ZnO∕p-Si and the N-drone-dope ZnNO√p-si diodes were explained in terms of the Anderson model and the space charge limited current model, respectively.
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Hydrogen peroxide treatment induced rectifying behavior of Au∕n-ZnO contact

TL;DR: In this paper, the Au∕n-ZnO contact from Ohmic to rectifying with H2O2 pretreatment was studied systematically using I-V measurements, x-ray photoemission spectroscopy, positron annihilation spectrography, and deep level transient spectrograms, and the formation of a rectifying contact can be attributed to the reduced conductivity of the surface region due to the removal of OH and formation of vacancy-type defects.
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Au/n-ZnO rectifying contact fabricated with hydrogen peroxide pretreatment

TL;DR: In this article, the rectifying property of the Au/ZnO contact was systemically investigated by varying the treatment temperature and duration, and the best performing Schottky contact was found to have an ideality factor of 1.15 and a leakage current of 10 �7 Ac m �2.
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Deep level transient spectroscopic study of neutron-irradiated n-type 6H-SiC

TL;DR: In this article, deep level transient spectroscopy has been employed to study the deep level defects introduced in n-type 6H-SiC after neutron irradiation, which have been detected in the temperature range of 100-450 K.
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Deep level defect in Si-implanted GaN n+-p junction

TL;DR: In this article, a deep level transient spectroscopy (DLTS) study has been performed on a GaN n+p junction fabricated by implanting Si into a Mg-doped p-type GaN epilayer.