Veeco

About: Veeco is a company organization based out in Plainview, New York, United States. It is known for research contribution in the topics: Wafer & Thin film. The organization has 657 authors who have published 638 publications receiving 11900 citations. The organization is also known as: Veeco Instruments.

An atomic force microscope tip designed to measure time-varying nanomechanical forces.

Abstract: Tapping-mode atomic force microscopy (AFM), in which the vibrating tip periodically approaches, interacts and retracts from the sample surface, is the most common AFM imaging method. The tip experiences attractive and repulsive forces that depend on the chemical and mechanical properties of the sample, yet conventional AFM tips are limited in their ability to resolve these time-varying forces. We have created a specially designed cantilever tip that allows these interaction forces to be measured with good (sub-microsecond) temporal resolution and material properties to be determined and mapped in detail with nanoscale spatial resolution. Mechanical measurements based on these force waveforms are provided at a rate of 4 kHz. The forces and contact areas encountered in these measurements are orders of magnitude smaller than conventional indentation and AFM-based indentation techniques that typically provide data rates around 1 Hz. We use this tool to quantify and map nanomechanical changes in a binary polymer blend in the vicinity of its glass transition. Phase changes and chemical compositional variations in materials on the nanoscale have been studied using various scanning force microscopy techniques. In these techniques, a force-sensing cantilever with a sharp tip is placed in continuous contact with the sample surface. Dynamical properties of the cantilever are adjusted depending on the material in contact with the tip. Examples of these techniques include ultrasonic force microscopy 1 , force modulation microscopy 2 , shear modulation force microscopy and lateral force microscopy 3,4 .T hese

Gas treatment systems

Abstract: An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.

Multi-gas distribution injector for chemical vapor deposition reactors

Abstract: A gas distribution injector [150] for chemical vapor deposition reactors [100] has precursor gas inlets [160, 165] disposed at spaced-apart locations on an inner surface [155] facing downstream toward a substrate [135], and has carrier openings [167] disposed between the precursor gas inlets [160, 165]. One or more precursor gases [180, 185] are introduced through the precursor gas inlets [160, 165], and a carrier gas [187] substantially nonreactive with the precursor gases is introduced through the carrier gas openings [167]. The carrier gas minimizes deposit formation on the injector [150]. The carrier gas openings may be provided by a porous plate [230] defining the surface or via carrier inlets [167] interspersed between precursor inlets. The gas inlets may removable [1780] or coaxial [1360].

Reactive ion beam etching method and a thin film head fabricated using the method

Abstract: A reactive ion beam etching method which employs an oxidizing agent in a plasma contained in an ion source (10) to control carbonaceous deposit (e.g., polymer) formation within the ion source and on the substrate. After operating the ion source with a plasma having a carbonaceous deposit forming species, a plasma (Ar+O2ions) containing an oxidizing agent (species) is generated within the ion source. Preferably, within the ion source a plasma is maintained essentially continuously between the time that the carbonaceous deposit forming species is present and the time that the oxidizing agent is present. Preferably, a reactive ion beam containing an oxidizing species is incident upon the sample at an angle which enhances the selectivity of the carbonaceous deposit (e.g., polymer) etching relative to other materials upon which the ion beam impinges. A thin film magnetic head (52, 54, 56, 58) is fabricated according to a pole (52, 58) trimming process which employs RIBE with an oxidizing species to remove any carbonaceous material (e.g., polymer) deposits formed during a previous fluorocarbon based RIBE step.

A nanomechanical device based on linear molecular motors

Abstract: An array of microcantilever beams, coated with a self-assembled monolayer of bistable, redox-controllable [3]rotaxane molecules, undergoes controllable and reversible bending when it is exposed to chemical oxidants and reductants Conversely, beams that are coated with a redox-active but mechanically inert control compound do not display the same bending A series of control experiments and rational assessments preclude the influence of heat, photothermal effects, and pH variation as potential mechanisms of beam bending Along with a simple calculation from a force balance diagram, these observations support the hypothesis that the cumulative nanoscale movements within surface-bound “molecular muscles” can be harnessed to perform larger-scale mechanical work