Showing papers in "Vacuum in 2003"

TL;DR: Barrier discharges (BDs) produce highly non-equilibrium plasmas in a controllable way at atmospheric pressure, and at moderate gas temperature, and provide the effective generation of atoms, radicals and excited species by energetic electrons.

TL;DR: In this paper, the authors present the present state and the prospects of non-coating plasma processes to generate mono functional surfaces of controlled amino group density, which appear most desirable for many applications.

TL;DR: In this paper, X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the coatings and confirmed the formation of superlattice structure at low modulation wavelengths, and the maximum hardness of the TiN/CrN multilayers was 3800kg/mm2 at?=80 A?, VB=-150V and T S=400xB0;C.

TL;DR: In this article, microstructural parameters like grain size, stress and chemical and phase composition influence the thermal stability of different hard coatings, such as TiN, (Ti, Al, V)N and CrN as well as the dual-phase nanocomposite coatings CrN-Cr2N and TiN-TiB2.

TL;DR: In this paper, α-alumina was deposited as a diffusion barrier by CVD on a nickel-based superalloy (CMSX-4) and then coated with NiCoCrAlY and ZrO 2.

TL;DR: In this paper, non-transferred DC steam (H2O) plasma working with 100kW was applied to minimize production of the toxic byproducts such as dioxins and furans of which formation is not avoidable in the conventional incineration.

TL;DR: In this article, a review of methods to suppress hydrogen outgassing from austenitic stainless steels in relation to ultra-high vacuum and extreme high vacuum is presented, including thermal treatment and modelling, permeation rate and the role of surfaces, diffusion barriers and coatings.

TL;DR: In this article, the basis of a new technology allowing the bonding of GaAs layers on various substrates is described, which consists in the use of a two-step thermal profile during hydrogen implantation.

TL;DR: In this article, a generalized regression neural network (GRNN) was used to model the etch process of plasma etching. And the etching process was characterized with a statistical experimental design.

TL;DR: In this article, the authors studied the temporal and spatial evolution of the dust formation in two types of capacitively coupled discharges in Ar/C2H2 and Ar/CH4 gas mixtures used for thin film deposition.

TL;DR: In this paper, a simple two-dimensional model that allows the study of the individual secondary electron orbits in a DC planar magnetron discharge is presented, where the focus is on the recapture of secondary electrons by the target, which is enabled by their small initial energy.

TL;DR: In this article, the application of energetic He and Ar ions for the purpose of improving polymer tribological properties is presented and the results have indicated clearly that ion bombardment produces important changes in the polymer surface morphology and its internal structure.

TL;DR: In this article, a combined mass spectrometry and IR absorption study is used to identify intermediate gas phase precursors in HMDSO/O 2 PECVD remote plasmas.

TL;DR: In this article, the authors proposed a continuous model that simulates growth of islands in a non-uniform field of the adsorbed atoms to simulate the dissolution of big islands, displacement of islands during growth in nonuniform diffusion field and induced dissolution of islands.

TL;DR: In this paper, Cr+Au and Ag Schottky diodes were prepared on n-type InP by using HF or Na 2 S+HF surface treatment for zero bias microwave detector purposes.

TL;DR: In this article, the authors have shown that the substrate coating temperature affects significantly the activation temperature, the pumping speed, and the gas surface capacity of a Ti-Zr-V film.

TL;DR: In this paper, the authors used magnetron sputtering of polyethylene (PE) using Ar as the working gas and applied AFM, ESCA, FTIR and FTIR techniques to investigate the films properties and composition, and found that the films sputtered at Radio frequency (RF) power up to 100 W have a plasma polymer structure whereas further increase of RF power results in hydrocarbon polymers more resembling conventional PE.

TL;DR: In this article, the effect of substrate temperature variations in the 100-300degreesC range and substrate bias voltage variation in the 0-200 V DC range for 45-180 nm thick TiN films were investigated.

TL;DR: In this article, the growth of indium-tin-oxide thin films as a function of thickness using DC reactive magnetron sputtering was investigated, showing that the grain sizes and domain boundaries grew clearly and the specific resistivities decreased with the film thickness.

TL;DR: In this paper, the ac conductivity and dielectric properties of amorphous Se films have been investigated in the frequency range 100-100-KHz and 100-400-K temperature range.

TL;DR: In this article, the same authors used low energy ion erosion in secondary ion mass spectrometry to analyze welded fume particles, which were collected during the welding process of steel performed with three different techniques: electron beam welding, gas tungsten arc welding, and shielded metal arc welding (SMAW).

TL;DR: In this article, optical properties of the binary system were investigated using spectrophotometer transmittance spectra in the wavelength (200 − 1100 nm) using Swanepole method.

TL;DR: In this paper, a bilayer bilayer was sputter-deposited on unheated glass substrates with a Cr layer about 20-nm thick, and the Au/Cr bilayer films were annealed in a vacuum of 5×10 −4 Â 4 Â Â Pa at 170°C, 180°C and 250°C for from 5 to 120 min, respectively.

TL;DR: The results of the reactive ion etching of GaN films on sapphire and bulk 4H-SiC in the fluorine containing plasmas are presented in this paper.

TL;DR: In this paper, the influence of ion implantation of N 2 + ions on the target voltage during magnetron sputtering of silver in an argon/nitrogen plasma was studied.

TL;DR: In this paper, low energy electron attachment to formic and acetic acid was studied by means of mass spectrometric detection of the product anions, and the energy spread of electron beam was 120 −meV (acetic acid) and 140 -meV(formic acid) in the case of formic acid.

TL;DR: In this paper, amorphous silicon oxynitride films were deposited on silicon substrates by plasma-enhanced chemical vapor deposition (PECVD), and the main purpose was to use silicon oxnitride film as a single-layer anti-reflection coating for Si-based optoelectronic devices.

TL;DR: In this article, the influence of nitrogen and titanium ion implantation on the friction coefficient, wear and microhardness of steel was studied and a significant improvement was observed in wear after the Ti ion implantations.

TL;DR: In this article, thin films of Zr 44 V 56 alloy getter films were prepared on stainless-steel substrates by magnetron sputtering, and the getter activation behavior was investigated by X-ray photoelectron spectroscopy and static secondary ion mass spectrometric (SSIMS).

TL;DR: In this paper, a series of transparent titanium dioxide thin films have been obtained on microscope glass slides by means of r.f. magnetron reactive sputtering using Ar and O2 mixed gases.