Journal ArticleDOI
High-energy negative ion beam obtained from pulsed inductively coupled plasma for charge-free etching process
O. V. Vozniy,G. Y. Yeom +1 more
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In this article, the authors describe a method of positive and negative ion extraction that allows the energy and flux of oppositely charged particles to be varied independently, and by scattering the ions off from a metal surface, it is possible to form a high-energy beam of neutrals from the negative ions by using the low-energy positive component of the beam current for better charge compensation.Abstract:
Negative ions in conventional inductively coupled plasma are often more chemically active than positive ions (for example, in CF4 or SF6 plasmas), but inconveniently they are trapped inside the sheath and cannot be used for high-energy surface etching in sources with a grid-type acceleration system. In this work we describe a method of positive and negative ion extraction that allows the energy and flux of oppositely charged particles to be varied independently. Then by scattering the ions off from a metal surface, it is possible to form a high-energy beam of neutrals from the negative ions by using the low-energy positive component of the beam current for better charge compensation.read more
Citations
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Journal ArticleDOI
Negative-ion production on carbon materials in hydrogen plasma:influence of the carbon hybridization state and the hydrogen content on H - yield
Ahmad Hassan Ahmad,Cédric Pardanaud,Marcel Carrere,Jean Marc Layet,A. Gicquel,Pravin Kumar,David Eon,Cédric Jaoul,Rah Richard Engeln,Gilles Cartry +9 more
TL;DR: In this article, high-oriented polycrystalline graphite (HOPG), boron-doped diamond (BDD), nanocrystalline diamond, ultra-nanocrystine diamond and diamond-like carbon surfaces are exposed to low-pressure hydrogen plasma in a 13.56MHz plasma reactor and relative yields of surface-produced H− ions due to bombardment of positive ions from the plasma are measured by an energy analyser cum quadrupole mass spectrometer.
Journal ArticleDOI
Alternative solutions to caesium in negative-ion sources: a study of negative-ion surface production on diamond in H-2/D-2 plasmas
G. Cartry,D. Kogut,K. Achkasov,Jean-Marc Layet,Thomas Farley,A. Gicquel,Jocelyn Achard,Ovidiu Brinza,Thomas Bieber,Hocine Khemliche,Philippe Roncin,Alain Simonin +11 more
TL;DR: In this paper, the negative ion yields obtained are presented as a function of different experimental parameters such as the exposure time, the sample bias which determines the positive ion impact energy and the sample surface temperature.
Journal ArticleDOI
Negative-ion surface production in hydrogen plasmas: modeling of negative-ion energy distribution functions and comparison with experiments
Ahmad Hassan Ahmad,J. Dubois,T. Pasquet,Marcel Carrere,Jean-Marc Layet,J B Faure,Gilles Cartry,Pravin Kumar,Tiberiu Minea,S Mochalskyy,Alain Simonin +10 more
TL;DR: In this paper, a negatively biased graphite sample (highly oriented pyrolitic graphite) was placed in a H2 low-pressure plasma and the negative ions were produced on the graphite surface upon positive-ion bombardment.
Journal ArticleDOI
Extraction of negative ions from pulsed electronegative capacitively coupled plasmas
TL;DR: In this article, the negative ion flux was found to significantly increase with the addition of highly electronegative gases (such as thermally attaching Cl2) even at a high pulse frequency of 10 kHz.
Journal ArticleDOI
Alternative solutions to caesium in negative-ion sources: a study of negative-ion surface production on diamond in H 2 /D 2 plasmas
G. Cartry,D. Kogut,K. Achkasov,Jean-Marc Layet,Thomas Farley,A. Gicquel,Jocelyn Achard,Ovidiu Brinza,Thomas Bieber,Hocine Khemliche,Philippe Roncin,Alain Simonin +11 more
TL;DR: In this paper, the negative ion yields obtained are presented as a function of different experimental parameters such as the exposure time, the sample bias which determines the positive ion impact energy and the sample surface temperature.
References
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Book
Principles of Plasma Discharges and Materials Processing
TL;DR: In this paper, the authors introduce the concept of particle and energy balance in discharges and introduce the theory of collision dynamics and wave-heated discharges, as well as chemical reactions and equilibrium.
Journal ArticleDOI
Charging of pattern features during plasma etching
J. C. Arnold,Herbert H. Sawin +1 more
TL;DR: In this article, the localized charging of a rectangular trench during the plasma etching of a perfectly insulating surface was modeled assuming an isotropic electron flux and monodirectional ion bombardment.
Journal ArticleDOI
Book reviewPrinciples of plasma discharges and material processing: M.A. Lieberman and A.J. Lichtenberg, John Wiley, New York, 1994, 572 pp
Journal ArticleDOI
Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams
TL;DR: In this article, an inductively coupled high density plasma source was used to generate an energetic (100s of eV), high flux (equivalent of ∼10s mA/cm2) oxygen atom neutral beam.
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