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Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools

K. Mallika, +1 more
- 21 Sep 2001 - 
- Vol. 396, Iss: 1, pp 146-166
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This article is published in Thin Solid Films.The article was published on 2001-09-21. It has received 44 citations till now. The article focuses on the topics: Diamond & Chemical vapor deposition.

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Citations
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A review of nucleation, growth and low temperature synthesis of diamond thin films

TL;DR: Diamond thin films have outstanding optical, electrical, mechanical and thermal properties, which make these attractive for applications in a variety of current and future systems as mentioned in this paper. But, their optical properties are not as good as those of conventional diamond thin films.
Journal ArticleDOI

Medical applications of diamond particles & surfaces

TL;DR: Methods for preparing synthetic diamond surfaces and particles are described and recent developments involving the use of diamond in prostheses, sensing, imaging, and drug delivery applications suggest that diamond-containing structures will provide significant improvements in the diagnosis and treatment of medical conditions over the coming years.
Journal ArticleDOI

Adhesion behaviour assessment on diamond coated silicon nitride by acoustic emission

TL;DR: In this article, the acoustic emission from cracking events in microwave plasma assisted chemical vapour deposition diamond coated Si 3 N 4 ceramics during Brale indentation tests was investigated.
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Nano to micrometric HFCVD diamond adhesion strength to Si3N4

TL;DR: In this paper, hot filament chemical vapour deposition technique was used to grow diamond films from nanometric to micro-crystalline grain sizes Their adhesion levels to a silicon nitride ceramic were compared after Brale tip indentation testing.
Journal ArticleDOI

CVD diamond coated silicon nitride self-mated systems: tribological behaviour under high loads

TL;DR: In this paper, the friction and wear behavior of self-mated chemical vapour deposited (CVD) diamond films coating silicon nitride ceramics (Si3N4) were investigated in ambient atmosphere.
References
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Book

The Properties of Diamond

Journal ArticleDOI

Vapor growth of diamond on diamond and other surfaces

TL;DR: In this article, the growth rate of homoepitaxial diamond films reached 1 μm/h at 1000°C; film properties were identical to those of bulk crystals.
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Relationships between processing, microstructure and properties of dense and reaction-bonded silicon nitride

TL;DR: In this paper, the relationship between powder properties, process conditions, densification and microstructure, as well as the interdependence between microstructures and properties is discussed.
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Thermal expansion of some diamondlike crystals

TL;DR: The thermal expansion of AlN, cubic BN, and BP has been measured from 77 to 1300 K by x−ray techniques as mentioned in this paper, and the derived thermal expansion coefficients are compared with those of diamond, Si, Ge, SiC, GaP, and BeO using the Debye temperature as a scaling parameter.
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Synthesis of diamonds by use of microwave plasma chemical-vapor deposition: Morphology and growth of diamond films

TL;DR: It is found that diamond particles grown on the substrate initially increase their size almost uniformly until the substrate is entirely covered, then a secondary growth takes place, followed by surface-restructuring processes such as ``fusion'' and ``absorption'' among secondary crystallites.
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