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Journal ArticleDOI

Micropatterned Films of Tungsten Nuclei for Subsequent Metallization Formed of a Phosphotungstic Acid‐Based Negative Resist

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TLDR
In this paper, a water-based tungsten-rich micro-lithographic resist consisting of phosphotungstic acid and polyvinyl alcohol (PVA) was used for the subsequent electroless deposition of nickel.
Abstract
Tungsten nuclei, for the subsequent electroless deposition of nickel, were formed of a water-based tungsten-rich microlithographic resist consisting of phosphotungstic acid and polyvinyl alcohol (PVA). Spinning the aqueous resist solution at 4000 RPM yields a pinhole-free 10 3 A thick negative resist film, containing ∼60 weight percent (w/o) tungsten. Exposure (≤100 mJ cm -2 ) of the resists to 254 nm light, postbaking and developing in an aqueous developer produces 0.3 μm features

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Journal ArticleDOI

Tunneling transport in polyoxometalate based composite materials

TL;DR: In this paper, the transport properties of planar planar polyoxometalates are investigated in terms of tunneling mechanisms and they reveal a conductivity peak at room temperature conditions for intermolecular distances less than 3 nm and electrode distance less than 100 nm.
Journal ArticleDOI

Tungstate polyoxometalates as active components of molecular devices

TL;DR: In this article, the effects of electrode material, electrode distance, and molecular concentration on the electronic transport characteristics of poly(methyl methacrylate) H3SiW12O40 polyoxometalates are investigated.
Journal ArticleDOI

Protein-resistant cross-linked poly(vinyl alcohol) micropatterns via photolithography using removable polyoxometalate photocatalyst.

TL;DR: A new protein patterning method where regions of the substrate are covered by a hydrophilic film that minimizes protein adsorption, and it is demonstrated that the polystyrene and the cross-linked PVA exhibit dramatically different performances in terms of protein physisorption.
Journal ArticleDOI

Tunneling and negative resistance effects for composite materials containing polyoxometalate molecules

TL;DR: In this paper, molecular compounds from the class of tungsten or molybdenum polyoxometalates (POMs) are examined as components of polymeric materials with potential use in molecular devices.
Journal ArticleDOI

Transport properties of polyoxometalate containing polymeric materials

TL;DR: In this article, molecular compounds that come from the class of tungsten or molybdenum polyoxometalates (POM) are examined as components of polymeric materials with potential use in nanolithography and molecular devices.
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