Journal ArticleDOI
On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists
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TLDR
In this article, a spatially encoded map of the response of the photoacid generator under study was obtained in a single camera image, and the amount of photoacid produced as a function of dose was measured with reference to the commercial resist Shipley SAL 605.Abstract:
The enhanced photospeed of chemically amplified photoresists is crucial for high throughput lithography required by the semiconductor industry. The photospeed depends directly on the efficiency of the generation of photoacid during exposure, which is a function of the properties of the photoacid generator compound used in the resist. We report a novel technique for photoacid generator evaluation which is convenient, fast, and robust. This technique involves “whole wafer” imaging of resist doped with pH-sensitive fluorophores and patterned with an array of fields of varying doses. A spatially encoded map of the response of the compound under study is thus obtained in a single camera image. We measure the amount of photoacid produced as a function of dose for three photoacid generator compounds with reference to the commercial resist Shipley SAL 605. The results demonstrate a one-to-one correspondence with lithographic performance as determined by the normalized remaining thickness technique.read more
Citations
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Optical Diagnostics for Thin Film Processing
TL;DR: Optical diagnostics are used to probe the plasma or neutral gas above the substrate, particles in the gas or on the surface, film surface and reactor walls, the film itself, and the substrate during thin film processing.
Journal ArticleDOI
A Protocol for the Verification of Acid Generation in 157 nm Lithography
Journal ArticleDOI
Nonionic photoacid generator behavior under high-energy exposure sources
TL;DR: In this paper, a series of nonionic photoacid generators (PAGs) are synthesized and their acid generation efficiency measured under deep ultraviolet (DUV) and electron beam exposures, and they are determined with an on-wafer method that uses spectroscopic ellipsometry to measure the absorbance of an acid sensitive dye (Coumarin 6).
Journal ArticleDOI
Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy
TL;DR: In this paper, a pH sensitive fluorescent molecule, coumarin 6 (C6), is doped into a 193-nm resist system for imaging, which is then spectroscopically imaged with an epi-fluorescence microscope.
Proceedings ArticleDOI
Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists
TL;DR: In this article, a photoresist copolymer with an acid-labile and a non-reactive monomer was used to demonstrate the correlation between polymer molecular structure and acid catalyzed reaction kinetics.
References
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Journal ArticleDOI
A Novel Photometric Method for the Determination of Photoacid Generation Efficiencies Using Benzothiazole and Xanthene Dyes as Acid Sensors
TL;DR: In this article, a photometric method for acid quantification in nonaqueous media has been developed to facilitate quantification for photoacid generators (PAGs) employed in resist compo...
Journal ArticleDOI
Fluorescent rhodol derivatives: Versatile, photostable labels and tracers
James E. Whitaker,Rosaria P. Haugland,Diane Ryan,Peter C. Hewitt,Richard P. Haugland,Franklyn G. Prendergast +5 more
TL;DR: Conjugates of a number of the rhodol fluorophores were generally more photostable and less pH sensitive than fluorescein conjugate and more fluorescent than TMR conjugates.
Journal ArticleDOI
Effect of acid diffusion on performance in positive deep ultraviolet resists
TL;DR: In this paper, two methods to measure aciddiffusion in positive acid catalyzed resists are described, one based on spectrophotometric titration and the other based on threshold acid density theory of image formation.
Proceedings ArticleDOI
Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists
TL;DR: The effect of amine additives in chemical amplification resists is discussed in this article, where 4-aminophenol and 2-(4aminophenyl)-2-(4-hydroxyphenyl) propane are investigated as model compounds from the viewpoint of sensitivity, diffusion and resolution.
Journal ArticleDOI
A study of acid diffusion in chemically amplified deep ultraviolet resist
Toshiro Itani,Hiroshi Yoshino,Shuichi Hashimoto,Mitsuharu Yamana,Norihiko Samoto,Kunihiko Kasama +5 more
TL;DR: In this paper, the postexposure bake dependence of photogenerated acid diffusion was investigated in a chemically amplified deep ultraviolet positive resist, which consisted of a tert-butoxycarbonyl protected polystyrene as base resin and 2,4dimethylbenzenesulfonic acid derivative as photoacid generator.