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Journal ArticleDOI

Optimal noise figure of microwave GaAs MESFET's

H. Fukui
- 01 Jul 1979 - 
- Vol. 26, Iss: 7, pp 1032-1037
TLDR
In this article, the optimal value of the minimum noise figure F o of GaAs MESFET's is expressed in terms of either representative equivalent circuit elements or geometrical and material parameters in simple analytical forms.
Abstract
The optimal value of the minimum noise figure F o of GaAs MESFET's is expressed in terms of either representative equivalent circuit elements or geometrical and material parameters in simple analytical forms. These expressions are derived on a semiempirical basis. The predicted values of F o for sample GaAs MESFET's using these expressions are in good agreement with the measured values at microwave frequencies. The expressions are then applied to show design optimization for low-noise devices. This exercise indicates that shortening the gate length and minimizing the parasitic gate and source resistances are essential to lower F o . Moreover, a simple shortening of the gate length may not bring an improved F o unless the unit gate width is accordingly narrowed. The maximum value of the unit gate width is defined as the width above which the gate metallization resistance becomes greater than the source series resistance. Short-gate GaAs MESFET's with optimized designs promise a superior noise performance at microwave frequencies through K band. The predicted values of F o at 20 GHz, for example, for a half-micrometer gate device and a quarter-micrometer gate device are 3 and 2 dB, respectively. These devices could be fabricated with the current technology.

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Citations
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Journal ArticleDOI

Modeling of noise parameters of MESFETs and MODFETs and their frequency and temperature dependence

TL;DR: In this article, a simple noise model of a microwave MESFET (MODFET, HEMT, etc.) is described and verified at room and cryogenic temperatures.
Journal ArticleDOI

Si/SiGe heterostructures: from material and physics to devices and circuits

TL;DR: In this paper, the authors present a review of the material properties, growth techniques, band structure and the main electronic devices of the Si/SiGe heterostructure system, in particular, the important device technologies in mainstream microelectronics.
Journal ArticleDOI

Determination of the basic device parameters of a GaAs MESFET

TL;DR: In this paper, the active channel properties of a gallium arsenide (GaAs) metal-semiconductor field effect transistor (mesfet) were determined using simple analytical expressions developed in terms of the geometrical and material parameters of a device.
Journal ArticleDOI

Ultra-high speed modulation-doped field-effect transistors: a tutorial review

TL;DR: In this article, a tutorial review on the modulation-doped field effect transistor (MODFET) and its application to ultra-low-noise, medium-power, and ultra-wide-band traveling-wave amplifiers as well as ultra-high-speed digital logic circuits is presented.
Journal ArticleDOI

Microwave CMOS-device physics and design

TL;DR: A qualitative understanding of the microwave characteristics of MOS transistors is provided in this article, which is directed toward helping analog IC circuit designers create better front-end radio-frequency CMOS circuits.
References
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Journal ArticleDOI

A Unipolar "Field-Effect" Transistor

TL;DR: In this article, the authors proposed a new form of transistor called unipolar field effect transistor, which is of the "field effect" type in which the conductivity of a layer of semiconductor is modulated by a transverse electric field.
Book ChapterDOI

Signal and Noise Properties of Gallium Arsenide Microwave Field-Effect-Transistors

TL;DR: In this article, the authors examined the signal and noise properties of gallium arsenide (GaAs) microwave field effect transistors (FETs) and found that radiofrequency instabilities due to this region, if they exist, occur at frequencies far above the normal frequency regime of microwave FETs.
Journal ArticleDOI

A Unipolar "Field-Effect" Transistor

Shockley
Journal ArticleDOI

Thermal Noise in Field-Effect Transistors

TL;DR: The limiting noise mechanism in field-effect transistors is thermal noise of the conducting channel as mentioned in this paper, which can be represented by a current generator in parallel to the output, and the value of i2 is calculated; for zero drain voltage the noise corresponds to thermal noise, and for other bias conditions the noise at a given gate voltage depends only slightly upon the drain voltage.
Journal ArticleDOI

Determination of the basic device parameters of a GaAs MESFET

TL;DR: In this paper, the active channel properties of a gallium arsenide (GaAs) metal-semiconductor field effect transistor (mesfet) were determined using simple analytical expressions developed in terms of the geometrical and material parameters of a device.