Journal ArticleDOI
Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
J. W. Coburn,Eric Kay +1 more
TLDR
In this article, the authors measured the potential of an electrically isolated surface in an rf diode sputtering glow discharge and investigated the influence on these potentials of both the geometry enclosing the discharge volume and of a positively biased auxiliary electrode in contact with the discharge.Abstract:
The plasma potential and the potential of an electrically isolated surface are measured in an rf diode sputtering glow discharge. The influence on these potentials of both the geometry enclosing the discharge volume and of a positively biased auxiliary electrode in contact with the discharge is investigated. It is shown that confining the discharge increases the plasma potential and the energy of positive ions incident on electrically isolated substrates, whereas applying a positive voltage to an auxiliary electrode also increases the plasma potential but does not significantly increase the energy of ions incident on electrically isolated substrates. The effect of rf modulation on the ionic energy distributions is demonstrated. This occurs as the ions pass through the plasma‐substrate sheath and results in a large broadening of the energy distributions of low‐mass species.read more
Citations
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Journal ArticleDOI
Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching
J. W. Coburn,Harold F. Winters +1 more
TL;DR: In this paper, the extent to which gas surface chemical reactions can be enhanced by energetic radiation (primarily ions and electrons) incident on the surface is described and some technological implications of this process in plasma etching technology and lithography are considered.
Journal ArticleDOI
rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications
TL;DR: In this article, the authors describe the deposition of amorphous hydrogenated hard carbon (a-C:H) thin films from benzene vapor in a rf plasma.
Journal ArticleDOI
Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
TL;DR: In this paper, the capacitive sheath approximation is used to relate the measured voltages to the measured plasma potential, and the effects of superimposing dc voltages on the excitation electrode are discussed.
Journal ArticleDOI
Ion energy distributions in rf sheaths; review, analysis and simulation
TL;DR: In this paper, a review and analysis of ion energy distributions arriving at the target of a radio frequency (rf) discharge is presented, which mainly discusses the collisionless regime, which is of great interest to experimentalists and modellers studying high-density discharges.
Journal ArticleDOI
Retarding‐field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in low‐pressure radio frequency discharges
Christian Bohm,Jérôme Perrin +1 more
TL;DR: In this paper, a four-grid electrostatic energy analyzer for measurements of the ion velocity distribution and the emission of secondary electrons on the electrodes of low-pressure radio frequency glow discharge systems has been conceived.
References
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Journal ArticleDOI
Ion Energies at the Cathode of a Glow Discharge
W. D. Davis,T. A. Vanderslice +1 more
TL;DR: In this article, the energy distribution of ions striking the cathode in a glow discharge has been measured for a series of gases including hydrogen, helium, neon, and argon.
Journal ArticleDOI
Application of RF discharges to sputtering
H. R. Koenig,Leon I Maissel +1 more
TL;DR: In this paper, the operation of rf discharges is described and the internal distribution of voltages is considered, and the significance of this with respect to sputtering, particularly of insulators, is then discussed.
Journal ArticleDOI
Plasma Sheath Formation by Radio‐Frequency Fields
H. S. Butler,G. S. Kino +1 more
TL;DR: In this article, it has been observed experimentally that the application of a radio-frequency voltage (10 kc/sec−50 Mc/sec) to any one of several electrode configurations around the outside of a plasma discharge tube results in a constriction of the luminous portion of the plasma away from the inner walls of the glass tube.
Journal ArticleDOI
Alloy Sputtering Studies with in situ Auger Electron Spectroscopy
M. L. Tarng,G. K. Wehner +1 more
TL;DR: In this paper, the changes in surface composition of a 55 Cu-45 Ni alloy (Constantan) target were studied under Ar+ ion bombardment as a function of bombarding energy.