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Journal ArticleDOI

Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system

K. Köhler, +4 more
- 01 Jan 1985 - 
- Vol. 57, Iss: 1, pp 59-66
TLDR
In this paper, the capacitive sheath approximation is used to relate the measured voltages to the measured plasma potential, and the effects of superimposing dc voltages on the excitation electrode are discussed.
Abstract
The plasma potential of 13.56‐MHz low‐pressure argon glow discharges has been measured for various modes of applying the rf power in a geometrically asymmetric planar system. The plasma potential is determined from the energy distribution of positive ions incident on the grounded electrode. The voltages on the excitation electrode (target electrode) are carefully measured and the capacitive sheath approximation is used to relate these measured voltages to the measured plasma potential. This approximation is successful in most of the situations encountered in this low‐pressure (20 mTorr) relatively low‐power density regime. The effects of superimposing dc voltages on the excitation electrode are discussed.

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Citations
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Hydrogen in crystalline semiconductors

TL;DR: A review of the properties of hydrogen in crystalline semiconductors is presented in this paper, together with the reactions of atomic hydrogen with shallow and deep level impurities that passivate their electrical activity.
Journal ArticleDOI

Transition between different regimes of rf glow discharges

TL;DR: A self-consistent fluid model of radio-frequency glow discharges has been used to analyze the existence of two different discharge regimes and of the transition between them, and a realistic description of the electron kinetics has been obtained by considering separately two electron groups representing, respectively, the tail and the bulk of the electrons distribution function.
Journal ArticleDOI

Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

TL;DR: In this article, an intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity.
Journal ArticleDOI

Particle simulations of radio-frequency glow discharges

TL;DR: In this paper, particle-in-cell simulations are used to study the structure of radiofrequency glow discharges in helium between parallel-plate electrodes, and the authors have examined a range of conditions and report on a variety of observed phenomena.
Journal ArticleDOI

Numerical modeling of low-pressure RF plasmas

TL;DR: In this article, a particle-in-cell simulation is used to model the plasma generated in a parallel plate RF reactor at low pressure, where the electric field and particle motion are obtained by finite-difference methods leading to the selfconsistent creation of sheaths on the boundaries.
References
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Journal ArticleDOI

Positive‐ion bombardment of substrates in rf diode glow discharge sputtering

TL;DR: In this article, the authors measured the potential of an electrically isolated surface in an rf diode sputtering glow discharge and investigated the influence on these potentials of both the geometry enclosing the discharge volume and of a positively biased auxiliary electrode in contact with the discharge.
Journal ArticleDOI

Ion Energies at the Cathode of a Glow Discharge

TL;DR: In this article, the energy distribution of ions striking the cathode in a glow discharge has been measured for a series of gases including hydrogen, helium, neon, and argon.
Journal ArticleDOI

Application of RF discharges to sputtering

TL;DR: In this paper, the operation of rf discharges is described and the internal distribution of voltages is considered, and the significance of this with respect to sputtering, particularly of insulators, is then discussed.
Journal ArticleDOI

Plasma Sheath Formation by Radio‐Frequency Fields

H. S. Butler, +1 more
- 01 Sep 1963 - 
TL;DR: In this article, it has been observed experimentally that the application of a radio-frequency voltage (10 kc/sec−50 Mc/sec) to any one of several electrode configurations around the outside of a plasma discharge tube results in a constriction of the luminous portion of the plasma away from the inner walls of the glass tube.
Journal ArticleDOI

A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System

TL;DR: In this paper, a bakable ultrahigh vacuum system has been constructed to sample the particle flux incident on the substrate of a planar diode sputtering system, where a beam of particles from the discharge is extracted into a long mean free path environment where it passes through a 90° deflection electrostatic analyzer into a quadrupole residual gas analyzer.
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