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Open AccessJournal ArticleDOI

Ultra-compact silicon nanophotonic modulator with broadband response

TLDR
In this paper, the authors demonstrate an on-chip, ultra-compact, electro-optic modulator with a record-high 1 dB per micrometer extinction ratio over a wide bandwidth range of 1 μm in ambient conditions.
Abstract
Electro-optic modulators have been identifi ed as the key drivers for optical communication and signal processing. With an ongoing miniaturization of photonic circuitries, an outstanding aim is to demonstrate an on-chip, ultra-compact, electro-optic modulator without sacrifi cing bandwidth and modulation strength. While silicon-based electro-optic modulators have been demonstrated, they require large device footprints of the order of millimeters as a result of weak non-linear electro-optical properties. The modulation strength can be increased by deploying a high-Q resonator, however with the trade-off of signifi cantly sacrifi cing bandwidth. Furthermore, design challenges and temperature tuning limit the deployment of such resonance-based modulators. Recently, novel materials like graphene have been investigated for electro-optic modulation applications with a 0.1 dB per micrometer modulation strength, while showing an improvement over pure silicon devices, this design still requires device lengths of tens of micrometers due to the ineffi cient overlap between the thin graphene layer, and the optical mode of the silicon waveguide. Here we experimentally demonstrate an ultra-compact, silicon-based, electro-optic modulator with a record-high 1 dB per micrometer extinction ratio over a wide bandwidth range of 1 μm in ambient conditions. The device is based on a plasmonic metal-oxide-semiconductor (MOS) waveguide, which effi ciently concentrates the optical modes ’ electric fi eld into a nanometer thin region comprised of an absorption coeffi cient-tuneable indium-tin-oxide (ITO) layer. The modulation mechanism originates from electrically changing the free carrier concentration of the ITO layer which dramatically increases the loss of this MOS mode. The seamless integration of such a strong optical beam modulation into an existing silicon-on-insulator platform bears signifi cant potential towards broadband, compact and effi cient communication links and circuits.

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Citations
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Gate-Tunable Conducting Oxide Metasurfaces

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High-speed plasmonic phase modulators

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Low-loss plasmon-assisted electro-optic modulator

TL;DR: Ohmic losses in plasmonic devices can be reduced by exploiting ‘resonant switching’, in which light couples to surface plAsmon polaritons only when in resonance and bypasses them otherwise.
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Nanoscale conducting oxide PlasMOStor.

TL;DR: An ultracompact PlasMOStor, a plasmon slot waveguide field-effect modulator based on a transparent conducting oxide active region, is experimentally demonstrated, demonstrating field- effect dynamics giving rise to modulation with high dynamic range, low waveguide loss and large modulation strength.
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Low contrast dielectric metasurface optics

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References
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Journal ArticleDOI

A graphene-based broadband optical modulator

TL;DR: Graphene-based optical modulation mechanism, with combined advantages of compact footprint, low operation voltage and ultrafast modulation speed across a broad range of wavelengths, can enable novel architectures for on-chip optical communications.
Book

Handbook of photovoltaic science and engineering

TL;DR: In this article, the role of policy in PV Industry Growth: Past, Present and Future (John Byrne and Lado Kurdgelashvili) is discussed, as well as future cell and array possibilities.
Journal ArticleDOI

Micrometre-scale silicon electro-optic modulator

TL;DR: Electro-optic modulators are one of the most critical components in optoelectronic integration, and decreasing their size may enable novel chip architectures, and here a high-speed electro-optical modulator in compact silicon structures is experimentally demonstrated.
Journal ArticleDOI

Evaporated Sn‐doped In2O3 films: Basic optical properties and applications to energy‐efficient windows

TL;DR: In this paper, the authors reviewed work on In2O3:Sn films prepared by reactive e−beam evaporation of In2 O3 with up to 9 mol'% SnO2 onto heated glass.
Journal ArticleDOI

Silicon optical modulators

TL;DR: The techniques that have, and will, be used to implement silicon optical modulators, as well as the outlook for these devices, and the candidate solutions of the future are discussed.
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