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Anabela G. Rolo

Researcher at University of Minho

Publications -  87
Citations -  1434

Anabela G. Rolo is an academic researcher from University of Minho. The author has contributed to research in topics: Raman spectroscopy & Thin film. The author has an hindex of 21, co-authored 87 publications receiving 1306 citations.

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Journal ArticleDOI

Absorption and Photoluminescence Study of CdS Quantum Dots: The Role of Host Matrix and Nanocrystal Size and Density

TL;DR: In this article, the absorption and photoluminescence (PL) of CdSdoped SiO2 films fabricated by RF co-sputtering (semiconductor volume fraction f=1-15%, nano-crystallite's mean size 5-7nm) and matrix-free films of close-packed cdS nanocrystallites (f~30%, size 2-5nm) produced by an original chemical method.
Journal ArticleDOI

Structural and photoluminescence studies of erbium-implanted nanocrystalline silicon thin films

TL;DR: In this article, hydrogenated amorphous and nanocrystalline silicon thin films were implanted with erbium-implanted wires and measured photoluminescence (PL) activity at 1.54 µm, with an FWHM of 5 nm.
Journal ArticleDOI

Influence of the Crystallisation Kinetics on the Microstructural Properties of α-PVDF

TL;DR: In this article, the kinetics of the isothermal crystallization from the melt at different crystallisation temperatures and the melting behavior of Poly(vinylidene fluoride) (PVDF) in the alpha phase has been investigated.
Journal ArticleDOI

THERMAL STABILITY OF ENERGY-EMISSION FROM CdTe NANOCRYSTALS EMBEDDED IN SiO2 THIN FILMS

TL;DR: In this article, the presence of CdTe nanocrystals inside the silica matrix was confirmed by Raman spectroscopy and grazing incidence X-ray diffraction, and temperature dependent photoluminescence measurements were carried out in the temperature range 15-295 K and revealed energy-emission thermal stability.
Book ChapterDOI

Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation

TL;DR: In this paper, a CdS microcrystal-doped SiO2 glass films were deposited using the magnetron rf-sputtering technique using thin thin films on glass, aluminium and silicon substrates.