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Bo Fu
Researcher at Shandong University
Publications - 15
Citations - 316
Bo Fu is an academic researcher from Shandong University. The author has contributed to research in topics: Crystal growth & Crystal. The author has an hindex of 7, co-authored 12 publications receiving 164 citations.
Papers
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Journal ArticleDOI
A review of β -Ga 2 O 3 single crystal defects, their effects on device performance and their formation mechanism
TL;DR: In this article, defects in β-Ga2O3 single crystals were summarized, including dislocations, voids, twin, and small defects, and their effects on device performance were discussed.
Journal ArticleDOI
Highly Narrow-Band Polarization-Sensitive Solar-Blind Photodetectors Based on β-Ga2O3 Single Crystals.
Xuanhu Chen,Wenxiang Mu,Yang Xu,Bo Fu,Zhitai Jia,Fang-Fang Ren,Shulin Gu,Rong Zhang,Youdou Zheng,Xutang Tao,Jiandong Ye +10 more
TL;DR: Highly narrow-band solar-blind photodetectors by light polarization engineering of the anisotropic transitions in β-Ga2O3 single crystals are presented and it is shown that direct transitions from valance subbands to the conduction band minimum are tuned between 4.53 and 4.76 eV.
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Characterization of the inhomogeneous barrier distribution in a Pt/(100)β-Ga2O3 Schottky diode via its temperature-dependent electrical properties
Guangzhong Jian,Guangzhong Jian,Qiming He,Wenxiang Mu,Bo Fu,Hang Dong,Hang Dong,Yuan Qin,Yuan Qin,Ying Zhang,Ying Zhang,Huiwen Xue,Shibing Long,Shibing Long,Zhitai Jia,Zhitai Jia,Hangbing Lv,Hangbing Lv,Qi Liu,Qi Liu,Xutang Tao,Ming Liu,Ming Liu +22 more
TL;DR: In this article, a Pt/β-Ga2O3 Schottky barrier diode with good performance characteristics, such as a low ON-resistance, high forward current, and a large rectification ratio, was fabricated.
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C-V and J-V investigation of HfO2/Al2O3 bilayer dielectrics MOSCAPs on (100) β-Ga2O3
Hang Dong,Hang Dong,Wenxiang Mu,Yuan Hu,Yuan Hu,Qiming He,Bo Fu,Huiwen Xue,Yuan Qin,Yuan Qin,Guangzhong Jian,Guangzhong Jian,Ying Zhang,Ying Zhang,Shibing Long,Shibing Long,Zhitai Jia,Hangbing Lv,Hangbing Lv,Qi Liu,Qi Liu,Xutang Tao,Ming Liu,Ming Liu +23 more
TL;DR: In this article, the performance of bilayer dielectric MOS capacitors with bilayer insulators was investigated through C − V and J − V measurement, which revealed that incoming high-k HfO2 makes both bilayer structures attain an increasing dielectrics constant, which means a better gate control ability in transistors comparing with single Al2O3.
Journal ArticleDOI
Schottky Barrier Rectifier Based on (100) $\beta$ -Ga2O3 and its DC and AC Characteristics
He Qiming,Wenxiang Mu,Bo Fu,Zhitai Jia,Shibing Long,Zhaoan Yu,Zhihong Yao,Wei Wang,Hang Dong,Yuan Qin,Guangzhong Jian,Ying Zhang,Huiwen Xue,Hangbing Lv,Qi Liu,Minghua Tang,Xutang Tao,Ming Liu +17 more
TL;DR: In this paper, a Schottky barrier rectifier was fabricated with a (100)-oriented Ga2O3 substrate grown by the edge-defined film-fed method, which had an effective donor concentration of approximately $2\times 10^{17}$ cm−3.