E
Emmanuel P. Giannelis
Researcher at Cornell University
Publications - 396
Citations - 41441
Emmanuel P. Giannelis is an academic researcher from Cornell University. The author has contributed to research in topics: Nanocomposite & Polymer. The author has an hindex of 88, co-authored 387 publications receiving 38528 citations. Previous affiliations of Emmanuel P. Giannelis include Foundation for Research & Technology – Hellas & University of Ljubljana.
Papers
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Journal ArticleDOI
Fouling Release Nanostructured Coatings based on PDMS-polyurea Segmented Copolymers
Jason Fang,Antonios Kelarakis,Dongyan Wang,Emmanuel P. Giannelis,John A. Finlay,Maureen E. Callow,James A. Callow +6 more
TL;DR: In this paper, a series of PDMS-polyurea segmented copolymers were correlated to their fouling release performance, showing that the work required to remove the microorganisms is significantly lower compared to coatings based on standard PDMS homopolymer.
Journal ArticleDOI
Enhanced actuation in functionalized carbon nanotube–Nafion composites
Huiqin Lian,Huiqin Lian,Weizhong Qian,Luis Estevez,Hailan Liu,Yuexian Liu,Tao Jiang,Kuisheng Wang,Wenli Guo,Emmanuel P. Giannelis +9 more
TL;DR: In this article, the performance of functionalized carbon nanotube (FCNT)-Nafion composite actuators was studied, in terms of water uptake, ion exchange capacity, proton conductivity, dynamic mechanical properties, and actuation behavior.
Patent
Organic-inorganic composites
TL;DR: In this article, an organic-inorganic composite body demonstrating electrical insulating behavior consisting essentially of lithium and/or sodium water-swelling mica crystals selected from the group of fluorhectorite, hydroxyl hectorite and boron fluorphlogopite, and solid solutions among those and between those and other structurally-compatible species.
Proceedings ArticleDOI
A new inorganic EUV resist with high-etch resistance
Markos Trikeriotis,Marie Krysak,Yeon Sook Chung,Christine Y. Ouyang,Brian Cardineau,Robert L. Brainard,Christopher K. Ober,Emmanuel P. Giannelis,Kyoungyong Cho +8 more
TL;DR: In this article, the inorganic photoresists are made of HfO2 nanoparticles and have shown high etch resistance that is 25 times higher than polymer resists.
Proceedings ArticleDOI
Development of an inorganic photoresist for DUV, EUV, and electron beam imaging
Markos Trikeriotis,Woo Jin Bae,Evan L. Schwartz,Marie Krysak,Neal Lafferty,Peng Xie,Bruce W. Smith,Paul A. Zimmerman,Christopher K. Ober,Emmanuel P. Giannelis +9 more
TL;DR: In this article, the authors developed new inorganic nanocomposite photoresists with significantly higher etch resistance than the usual polymer-based photoresist, which can provide several advantages to conventional chemically amplified resist(CAR) systems, including improved depth of focus (DOF) and reduced line edge roughness.