scispace - formally typeset
F

Feifei Fan

Researcher at University of Nevada, Reno

Publications -  34
Citations -  4142

Feifei Fan is an academic researcher from University of Nevada, Reno. The author has contributed to research in topics: Silicon & Amorphous solid. The author has an hindex of 24, co-authored 34 publications receiving 3566 citations. Previous affiliations of Feifei Fan include Georgia Institute of Technology.

Papers
More filters
Journal ArticleDOI

Fracture toughness of graphene

TL;DR: The combined experiment and modelling verify the applicability of the classic Griffith theory of brittle fracture to graphene and quantifies the essential fracture properties of graphene and provides mechanistic insights into the mechanical failure of graphene.
Journal ArticleDOI

Two-phase electrochemical lithiation in amorphous silicon

TL;DR: The two-phase lithiation can be the fundamental mechanism underpinning the anomalous morphological change of microfabricated a-Si electrodes, i.e., from a disk shape to a dome shape, which is critical to the development of microstructurally stable electrodes for high-performance lithium-ion batteries.
Journal ArticleDOI

In situ transmission electron microscopy study of electrochemical sodiation and potassiation of carbon nanofibers.

TL;DR: In situ TEM experiments reveal the mechanical degradation of CNFs through formation of longitudinal cracks near the c-C/d-C interface during sodiation and potassiation, shedding light onto the development of carbon-based electrodes for NIBs and KIBs.
Journal ArticleDOI

Self-limiting lithiation in silicon nanowires.

TL;DR: In this article, the rate of growth of a surface layer of amorphous LixSi in crystalline Si nanowires during the first lithiation was measured using in situ transmission electron microscopy, which is attributed to the retardation effect of the lithiation-induced stress.