Harald Bosse

TL;DR: In this paper, a review of measurement technologies for precision positioning in manufacturing industries is presented, followed by a discussion on traceability and standards, and some advanced applications of measurement technology for manufacturing industries.

TL;DR: In this paper, a conventional scanning electron microscope operated in transmission mode (TSEM) was used for imaging silica, gold and latex nanoparticles, which is a promising tool for dimensional characterization of nanoparticles.

TL;DR: A heterodyne absolute distance interferometer with a macroscopic range, based on a promising optical source, is presented, with an agreement well within 15 μm, for a range up to 10 m.

TL;DR: The requirements on the use of scanning electron microscopy (SEM) as a measurement technique for the process control of dimensional parameters are most challenging in the production of masks and wafers in the semiconductor industry as mentioned in this paper.

TL;DR: In this article, a new 3D atomic force microscopy (3D-AFM) with vertical and torsional oscillation modes is introduced, in which the tip is approached towards the surface until the desired tip-sample interaction is detected and then immediately withdrawn from the surface.