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Harri Lipsanen

Researcher at Aalto University

Publications -  439
Citations -  8902

Harri Lipsanen is an academic researcher from Aalto University. The author has contributed to research in topics: Photoluminescence & Nanowire. The author has an hindex of 41, co-authored 419 publications receiving 7505 citations. Previous affiliations of Harri Lipsanen include University of Helsinki & Bell Labs.

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New Approach for Thickness Determination of Solution-Deposited Graphene Thin Films

TL;DR: The results suggest that the SPR method may provide a new pathway for the thickness measurement of thin films fabricated from any nanomaterial containing inks, even at sub-10 nm thickness.
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Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

TL;DR: The plasma etch characteristics of aluminum nitride (AlN) deposited by low-temperature, 200°C, plasma enhanced atomic layer deposition (PEALD) was investigated for reactive ion etch (RIE) and inductively coupled plasma-reactive ion (ICP-RIE)-based systems using various mixtures of SF6 and O2 under different etch conditions.
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Strain-compensated GaPN/GaP heterostructure on (0?0?1) silicon substrates for intermediate band solar cells

TL;DR: In this article, a strain-compensated GaPN/GaP heterostructure on silicon substrates for intermediate band solar cells (IBSCs) grown by metalorganic vapour phase epitaxy is investigated through the investigation of strain-induced frequency shift of the LO? phonons.

Maskless selective growth of InGaAs/InP quantum wires on (100)GaAs

TL;DR: In this article, a new fabrication process to create InGaAs/InP quantum wires on (100) GaAs substrates is demonstrated, based on the selectivity of the growth of InP on lines created by focused ion beam bombardment, together with the selection of growth of GaAs on the InP wires.
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Tailoring of energy levels in strain-induced quantum dots

TL;DR: In this article, strain-induced quantum dots with properties that can be tailored have been fabricated by growing small InP islands on top of an InGaAs/GaAs near-surface quantum well.